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中国物理学会期刊

La掺杂对Bi4Ti3O12薄膜铁电性能的影响

CSTR: 32037.14.aps.55.5551

Effect of La doping on ferroelectric properties of Bi4Ti3O12 thin film

CSTR: 32037.14.aps.55.5551
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  • 利用Sol-Gel法在Pt/Ti/SiO2/Si衬底上制备出Bi4Ti3O12和Bi3.25La0.75Ti3O12薄膜,研究了La掺杂对Bi4Ti3O12薄膜的晶体结构、铁电性能和疲劳特性的影响,发现La掺杂没有改变Bi4Ti3O12薄膜的基本晶体结构,并且提高了Bi4Ti3O12铁电薄膜的剩余极化值和抗疲劳性能,对La掺杂改善Bi4Ti3O12铁电薄膜性能的机理进行了讨论.

     

    The Bi4Ti3O12 and Bi3.25La0.75Ti3O12 thin films are prepared on the Pt/Ti/SiO2/Si substrate using sol-gel method. The structures Pt/Bi3.25La0.75Ti3O12/Pt and Pt/Bi4Ti3O12/Pt are fabricated. The effects of La doping on the microstructures, and ferroelectric properties of Bi4Ti3O12 films are investigated. The 2Pr with test voltage 6V for the sample annealed at 700℃ increased from 12.5 μC/cm2 to 18.6 μC/cm2, and 2Vc is still 2.8 V when the La3+ ions occupy part of Bi3+ sites. The Bi3.25La0.75Ti3O12 films showed fatigue-free behavior. The mechanism of improvement of La-doped Bi4Ti3O12 ferroelectric thin films is discussed.

     

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