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中国物理学会期刊

离子注钇对镍900℃高温氧化行为及氧化膜性能的影响研究

CSTR: 32037.14.aps.55.6157

Influence of yttrium ion-implantation on oxidation behavior of nickel and property of oxide scale at 900℃

CSTR: 32037.14.aps.55.6157
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  • 采用热重分析对纯镍及其表面离子注钇样品在900℃空气中的恒温氧化动力学规律进行了研究.用扫描电子显微镜和透射电子显微镜对含钇和不含钇氧化膜的微观形貌及结构进行了观测.用声发射方法对氧化膜在恒温生长阶段和空冷阶段的开裂与剥落进行了实时监测,根据相应的氧化膜开裂模型,对声发射信号在时域和数域上的分布情况进行了分析.结果表明离子注钇显著降低了镍的恒温氧化速率,提高了表面NiO膜的抗开裂和抗剥落性能.离子注钇提高镍抗氧化性能的原因主要是钇细化了表面NiO膜的晶粒、提高了氧化膜的高温塑性和蠕变能力,并显著降低了Ni/NiO界面缺陷的数量和大小.

     

    Isothermal oxidation behaviors of pure and yttrium-implanted nickel were studied at 900℃ in air. SEM and TEM were used to examine the oxide scales formed on nickel substrate. Acoustic emission (AE) technique was used to monitor the cracking and spalling of oxide film in isothermal oxidizing stage and subsequent air-cooling stage. AE signals were analyzed in time and number domain according to the related oxide fracture model. It was found that Y-implantation greatly lowered the isothermal oxidizing rate of nickel and improve the anti-cracking and anti-spalling properties of NiO oxide film. The main reason for the improvement was that Y-implantation greatly reduced the grain size of NiO and increased the high temperature plasticity and creeping ability of the oxide film. Meanwhile, Y-implantation reduced the size and number of Ni/NiO interfacial defects, hence remarkably enhanced the adhesion of protective NiO oxide scale formed on nickel substrate.

     

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