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中国物理学会期刊

SiC纳米杆的弛豫性能研究

CSTR: 32037.14.aps.56.643

Investigation of the SiC nano-bar relaxation characteristics

CSTR: 32037.14.aps.56.643
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  • 采用Tersoff势对SiC驰豫性能进行了分子动力学模拟.模拟了SiC在驰豫过程中的动态平衡变化过程,研究了表面效应和小尺寸效应对原子位置,原子能量分布的影响.模拟结果表明,SiC纳米杆受表面效应和小尺寸效应的影响很大,在不加外载和约束的情况下,出现了不同于宏观SiC杆的弯扭屈伸现象,最终形成了带有一定扭转弯曲量、总能量达到最低的稳定状态.

     

    The SiC nano-bar relaxation has been investigated using MD method. The Tersoff potential is adopted as the potential function. The characteristic of the homeostasis of SiC nano-bar relaxation is demonstrated. The nano-bar is affected by the strong surface effect and small size effect. The phenomena of torsion and bending is observed during the relaxation.

     

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