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中国物理学会期刊

节瘤缺陷对中红外高反射膜电场增强影响的数值分析

CSTR: 32037.14.aps.56.6588

Analysis of laser intensification by nodular defects in mid-infrared high reflectance coatings

CSTR: 32037.14.aps.56.6588
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  • 运用时域有限差分(FDTD)方法建立了薄膜中节瘤缺陷在高斯激光照射下电磁场响应模型,分析了节瘤的深度、起始颗粒大小和入射光角度对薄膜中电磁场的影响。结果表明:节瘤缺馅对薄膜中电场强度有显著的加强作用,其内部峰值场强是入射光的6倍,大而浅节瘤缺陷对倾斜入射p偏振态的激光具有最高的加强效应.

     

    Electric field modeling of nodular defects is performed to investigate the interaction between defective multilayer coatings and Gaussian profile laser beam. Light intensity is significantly enhanced as large as 6 times within the nodular defects. Different geometries of defects irradiated by laser beams at 0 to 40 deg incident laser angles are analyzed. Nodules with large but shallow seeds, or irradiation of 40 deg p-polarized laser beam, tends to produce the greatest enhancement effect.

     

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