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中国物理学会期刊

a-Si(n)/c-Si(p)异质结太阳电池薄膜硅背场的模拟优化

CSTR: 32037.14.aps.57.3212

Optimizing polymorphous silicon back surface field of a-Si(n)/c-Si(p) heterojunction solar cells by simulation

CSTR: 32037.14.aps.57.3212
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  • 采用AFORS-HET数值模拟软件,对不同带隙的薄膜硅材料在a-Si(n)/c-Si(p)异质结太阳电池上的背场效果进行了模拟,分析了影响背场效果的原因,得到了薄膜硅背场在a-Si(n)/c-Si(p)异质结太阳电池上的适用条件为薄膜硅材料是带隙16 eV,硼掺杂浓度在1018cm-3以上的微晶硅材料,其最佳厚度在5nm左右. 这种背场从工艺上易于实现,并且,与常用的Al扩散背场相比,在相同的掺杂浓度下,电池效率可以大大提高.

     

    Back surface field (BSF) effect of polymorphous silicon with different band gaps on a-Si(n)/c-Si(p) heterojunction solar cell was simulated and analyzed by utilizing AFORS-HET software. It was predicted that the polymorphous silicon capable of producing the optimal BSF effect is the microcrystalline silicon with band gap of 16 eV,the doped concentration of 1018cm-3 and the thickness about 5nm. Such microcrystalline silicon BSF is easy to realize in practice. It makes the efficiency of solar cell much higher than that using the conventional Al BSF with the same doping concentration.

     

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