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中国物理学会期刊

溅射制备纳米晶GaN∶Er薄膜的室温发光特性

CSTR: 32037.14.aps.57.3786

Room temperature visible photoluminescence from nanocrystalline GaN∶Er film prepared by sputtering

CSTR: 32037.14.aps.57.3786
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  • 利用直流磁控共溅射方法制备了GaN:Er薄膜.X射线衍射结果显示薄膜为纳米多晶结构,根据谢乐公式,计算得到了GaN薄膜晶粒的平均大小为58nm;透射电子显微镜结果显示为非晶基质中镶嵌了GaN纳米颗粒,尺寸在6—8nm之间;紫外可见谱结果表明在500—700nm的可见光范围内,薄膜的平均透过率大于80%,在紫外可见谱基础上,利用Tauc公式计算得到了纳米晶GaN薄膜的光学带隙为322eV;最后,测量了GaN:Er薄膜的室温光致发光谱,获得了Er3+离子在554nm处的强烈绿光发射.

     

    GaN:Er thin film has been prepared by direct current (DC) planar magnetron reactive sputtering deposition. The film was characterized by X-ray diffraction (XRD), ultraviolet—visible (UV—Vis) spectroscopy, transmission electron microscope (TEM) and photoluminescence (PL) spectroscopy, XRD shows the structure of the film was nano/poly-crystalline. The average grain size of the film was derived from XRD peaks using the Scherrer formula and the value was 58nm. TEM result indicated that the film was GaN nano-particles embed in amorphous matrix and the particle size was between 6—8nm. UV—Vis transmission spectrum shows that the transmission ratio of the film exceeds 80% in the visible zone from 500nm to 700nm. From UV-Vis spectrum, the optical band gap of the film was calculated using Tauc plot and the value was 322eV. Last, PL was measured by fluorescence spectrometer at room temperature and green emission of Er3+ ions was clearly observed for the transition: 4S3/2(2H11/2)—4I15/2(554nm).

     

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