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中国物理学会期刊

Ni/4H-SiC肖特基势垒二极管的γ射线辐照效应

CSTR: 32037.14.aps.58.2737

Gamma-ray radiation effect on Ni/4H-SiC SBD

CSTR: 32037.14.aps.58.2737
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  • 对制备的Ni/4H-SiC肖特基势垒二极管(SBD)进行了γ射线辐照试验,并在辐照过程中对器件分别加0和-30?V偏压.经过1?Mrad(Si)总剂量的γ射线辐照后,不同辐照偏压下的Ni/4H-SiC肖特基接触的势垒高度和理想因子没有退化,SiC外延层中的少子寿命也没有退化.辐照后器件的反向电流下降,这是由于器件表面的负界面电荷增加引起的.研究表明,辐照偏压对Ni/4H-SiC SBD的辐照退化效应没有明显的影响.

     

    Ni/4H-SiC Schottky barrier diodes (SBDs) were fabricated, and irradiated with the 60Co gamma-ray source to the accumulated dose of 1 Mrad(Si). The 0 V and -30 V bias voltage were applied to the SBDs during irradiation. After 1Mrad(Si) radiation, the Schottky barrier height and ideality factor of the Ni/4H-SiC SBDs under different bias voltages basically remain at the same values, and the minority carrier lifetime of the epitaxial layer also has no degradation. The reverse current decreases after radiation, which can be explained by the negative surface charge increase. The results show radiation bias voltage has no obvious influence on the radiation effect of the Ni/4H-SiC SBD.

     

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