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中国物理学会期刊

纳米β-FeSi2/a-Si多层膜室温光致发光分析

CSTR: 32037.14.aps.58.4117

Room-temperature photoluminescence analysis of nano-β-FeSi2/a-Si multilayer films

CSTR: 32037.14.aps.58.4117
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  • 采用射频磁控溅射的方法,在Si(100)基片上制备了纳米β-FeSi2/Si多层结构,利用X射线衍射、透射电子显微镜、光致发光光谱等表征技术,研究了β-FeSi2/Si多层结构的结构、成分和光致发光特性.研究结果表明:利用磁控溅射法得到的Fe/Si多层膜,室温下能够检测到β-FeSi2的1.53 μm处光致发光信号;未退火时多层膜是(非晶的FeSi2+β-FeSi2颗粒)/非晶Si结构,退火后则是

     

    Nano-β-FeSi2/a-Si layered structure was successfully deposited on Si (001) substrates using radio-frequency magnetron sputtering method. X-ray diffraction, transmission electron microscopy and photoluminescence (PL) analyses were used to characterise the structure, composition and photoluminescence properties of β-FeSi2/Si multilayer films. The results show that the peak at wavelength of 1.53 μm is observed from Fe/Si multilayer films by PL at room temperature. Without annealing, The films are of (amorphous FeSi2+ Nano-β-FeSi2 particles) / amorphous Si structure, whereas after annealing, the films are of β-FeSi2 particles/(crystal Si + amorphous Si) structure. Furthermore, the same PL intensity between as-grown and annealed samples indicates that identical luminescence property can be excited from amorphous FeSi2+β-FeSi2 particles and β-FeSi2 particles. In this experiment, the peak at wavelength of 1.53 μm is also a further indication of the semiconducting properties of amorphous FeSi2.

     

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