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中国物理学会期刊

Mn和N共掺ZnO稀磁半导体薄膜的研究

CSTR: 32037.14.aps.58.5763

Activation of room-temperature ferromagnetism in Mn doped ZnO thin films by N codoping

CSTR: 32037.14.aps.58.5763
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  • 使用对Zn2N3:Mn薄膜热氧化的方法成功制备了高含N量的Mn和N共掺ZnO的稀磁半导体薄膜.在没有N离子共掺的情况下,ZnO:Mn薄膜的铁磁性非常微弱;如果进行N离子的共掺杂,就会发现ZnO:Mn薄膜在室温下表现出非常明显的铁磁性,饱和离子磁矩为0.23 μB—0.61 μB.这说明N的共掺激发了ZnO:Mn薄膜中的室温铁磁性,也就是受主的共掺引起的空穴有利于ZnO中二价Mn离子的铁磁性耦合,这和最近的相关理论研究符合很好.

     

    Mn doped ZnO films with and without N codoping have been fabricated by oxidative annealing of sputtered Zn:Mn and Zn2N3:Mn films on silicon substrates in flowing O2 ambient. It was found that the ZnO:Mn films show very weak ferromagnetic behavior, while for those with N codoping, significant ferromagnetism with a moderate saturation magnetization of about 0.23—0.61 μB per Mn2+ ion was observed at room temperature. It suggests that significant ferromagnetism in ZnO:Mn films could be activated by N codoping. The results indicate that holes are favorable for ferromagnetic ordering of the doped Mn2+ ions in ZnO, in agreement with the recent theoretical studies.

     

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