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中国物理学会期刊

基于Geant 4的介质深层充电电场计算

CSTR: 32037.14.aps.58.684

Geant 4-based calculation of electric field in deep dielectric charging

CSTR: 32037.14.aps.58.684
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  • 基于Geant4模拟了电子在Teflon介质中的电荷输运过程,获得了其内部的电流密度、剂量率和电荷沉积量沿深度的分布曲线,进而利用电荷连续性方程、泊松方程和深层俘获方程求解出Teflon中高能量、小束流电子辐照下的电场分布. 将介质平板充电过程简化为屏蔽铝板与分层介质组成的Geant4模型,电子源为1.0MeV,0.1pA/cm2的平面源. 通过记录经过各层介质的电子电量和各层介质内沉积能量和电子数目,用统计平均的方法获得了介质内电流密度、剂量率和电荷沉积量沿深度的分布规律. 介质内

     

    Based on Geant4 particle transfer simulation, the internal current density, dose rate and charge deposition profiles of Teflon are acquired, and then the electric field under high energy and low density e-beam radiation is calculated with radiation-induced conductivity model of charging dynamics, which includes the continuity equation, Poisson equation and deep trap equation. According to Geant4 package, the charging model of dielectric is simplified as a compound structure consisting of shielding aluminum and multiple-layer plates radiated by 1.0MeV energy and 0.1 pA/cm2 flux density surface source. With statistical method, the distributions of internal current density, dose rate and charge deposition are obtained and normalized with the above flux density. Substituting these results into RIC model, the distributions of electric field in Teflon are calculated under various grounding conditions. It shows that the charge density, electric field and potential for the back side grounding are higher than these for the front side grounding, which tends to induce internal discharging. The electric field calculated for the critical internal discharging conditions in space is also consistent with the threshold field of dielectric Teflon(1e7V/m).

     

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