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中国物理学会期刊

C60分子在Si(111)-7×7表面分子束外延生长的STM研究

CSTR: 32037.14.aps.59.636

STM studies of the epitaxial growth of C60 molecules on Si(111)-7×7 surface

CSTR: 32037.14.aps.59.636
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  • 在超高真空中采用分子束外延(molecular beam epitaxial)技术进行C60分子在硅(111)-7×7表面的生长,并利用扫描隧道显微镜进行原位研究.室温下,相对于无层错半胞(unfaulted half unit cell),C60更易于吸附在有层错半胞(faulted half unit cell).表面台阶处的电子悬挂键密度最高,通过控制温度和时间进行退火处理后,C60分子会向着台阶的方向扩散并聚集.测量分子在不同吸附位

     

    The results of UHV-STM investigation of C60 at various adsorption sites on Si(111)-7×7 surface using MBE were presented. At room temperature, molecules prefer the faulted half unit cell to unfaulted half unit cell. Through controlling the annealing temperature and time, C60 molecules could directionally move towards step edges where the density of electronic dangling bonds is the highest. The measurement of diameter and height at each adsorption site shows different intensities of interaction between molecules and Si atoms. We also studied the multilayer growth process of C60 molecules on Si(111)-7×7 surface, and observed the local ordering of the first layer after annealing at 600℃, which shows the realization of the growth mode transformation from Stankski-Krastanov to Frank-van der Merwe mode.

     

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