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中国物理学会期刊

紫外波段高透过率铜铟掺杂SnO2薄膜的研究

CSTR: 32037.14.aps.59.8172

SnO2:(Cu,In) films with high transmittance in ultraviolet region

CSTR: 32037.14.aps.59.8172
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  • 采用反应蒸发的方法,在玻璃、Corning7059玻璃及石英玻璃衬底上制备了SnO2:(Cu,In)透明导电薄膜,对薄膜的各种元素的含量做了分析, 给出了各种元素在膜中的分布情况;测量了薄膜的透过率,结果显示个别样品对紫外线有较高透过率,退火过程对透过率有影响.测量了电阻率与温度的关系,同时解释了样品的阻-温特性.对材料的光学带隙与吸收系数的关系做了讨论,给出了用透过率曲线确定光学带隙的简易方法.讨论了扩展态迁移率与迁移率边和费米能级之间的关系.结果显示,用铜、铟掺杂的氧化锡透明导电

     

    By reactive evaporation method, the SnO2:(Cu,In) transparent conductive films are prepared on glass, Corning7059 glass and quartz glass substrates separately. The element contents are analyzed, the distributions of all elements in the films are given, and the transmittances of samples are also measured. The results show that the UV transmittance of individual sample is high, and the transmittance of the film depends on annealing process. The resistance-temperature characteristics are measured and explained. The relationship between optical band gap and absorption coefficient is discussed. The simple method in which the transmittance curve is used to determine the optical band gap is given. The relation between mobility of the extended state and mobility edge with Fermi level is discussed. The results show that the preparation of copper and indium co-doped tin oxide transparent conductive films has achieved the purpose of reducing the cost, and some particular samples have wide band gap.

     

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