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中国物理学会期刊

界面缺陷态密度与衬底电阻率取值对硅异质结光伏电池性能的影响

CSTR: 32037.14.aps.59.8870

Effects of substrate resistivity and interface defect density on performance of solar cell with silicon heterojunctions

CSTR: 32037.14.aps.59.8870
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  • 在异质结前界面缺陷态密度Dit1和异质结背界面缺陷态密度Dit2均取不同值时, 对p型单晶硅(c-Si(p))为衬底的硅异质结太阳电池的衬底电阻率ρ与电池性能的关系进行了数值研究.结果表明:衬底电阻率的最优值ρop取决于前界面缺陷态密度Dit1,且ρop随着Dit1的增大而增大;当ρ>ρop时, 背界面缺陷态密度Dit2对衬底电阻率的可取值范围具有较大影响,Dit2越大衬底电阻率的可取值范围越小.

     

    For silicon heterojunction solar cell with p-type a-Si:H back surface field, the effects of substrate resistivity on the performance of solar cell with different defect densities on the front and the rear surfaces of the p-type c-Si wafer are investigated numerically by computer simulation. The results indicate that the optimized resistivity of the substrate (ρop) is related to the interface defect density on the front surface of c-Si wafer (Dit1), and ρopincreases with the increase of Dit1.The value scale of resistivity of substrate is influenced greatly by the interface defect density on the rear surface of c-Si wafer (Dit2) for ρ>ρop, and the larger the value of Dit2, the smaller will the range of acceptable ρ value be.

     

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