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中国物理学会期刊

X射线吸收谱对Ga0.946Mn0.054As薄膜中缺陷的研究

CSTR: 32037.14.aps.60.016101

The study of defects in Ga0.946Mn0.054As by X-ray absorption spectra

CSTR: 32037.14.aps.60.016101
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  • 采用低温分子束外延法(LT-MBE)制备出Ga0.946Mn0.054As稀磁半导体(DMS)薄膜.通过X射线吸收谱(XAS)研究影响Ga0.946Mn0.054As薄膜性质的主要缺陷Mn间隙原子(MnI)和As反位原子(AsGa).实验结果表明,在较低生长温度(TS=200℃)下Ga0.946Mn0.054

     

    The influence of the major compensating defects As antisites (AsGa) and Mn interstitials (MnI) in the Ga0.946Mn0.054As diluted magnetic semiconductor (DMS) were studied by X-ray absorption spectra (XAS). The experimental results show that the defects in Ga0.946Mn0.054As grown at lower temperature (TS=200℃) is mainly AsGa, but at TS>230℃ MnI is the major defects. On the other hand, a higher LT-annealing temperature (250℃) can remove MnI out of the Ga0.946Mn0.054As lattice, and the highest Curie temperature (TC=130 K) is reached. Moreover, it is indicated that the LT-annealing process can increase the number of MnGa atoms by reducing the concentration of AsGa defects and driving MnI defects to fill up the holes left by AsGa.

     

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