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中国物理学会期刊

图形衬底量子线生长制备与荧光特性研究

CSTR: 32037.14.aps.60.020703

Preparation and photoluminescence study of patterned substrate quantum wires

CSTR: 32037.14.aps.60.020703
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  • 报道了在V型槽图形衬底上利用分子束外延技术外延生长的GaAs/AlGaAs量子线.外延截面在扫描电子显微镜下可以看到在V型槽底部形成了弯月型量子线结构,量子线尺寸约为底边60 nm高14 nm的近三角形.低温87 K下光致发光谱测试在793.7和799.5 nm处出现峰值,验证了量子线的存在.理论近似计算结果显示,相比等宽度量子阱有8 meV的蓝移正是由于横向量子限制引起的.

     

    GaAs/AlGaAs quantum wires grown by molecular beam epitaxy on a V-groove patterned substrate was described. The cross section of scan electron microscopy (SEM) image shows that crescent-type quantum wire were formed at the V groove bottom, which is a triangle of about 60nm in width and 14nm in height. Two peaks at 793.7nm and 799.5nm of photoluminescence spectrum at 87K verified the existence of quantum wires. Theoretical calculation gives 8meV blue shift, which is proved to be casued by lateral confinement compared with quantum well of the same width.

     

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