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中国物理学会期刊

基于SOI技术的单层多晶EEPROM和SONOS EEPROM抗总剂量辐照特性研究

CSTR: 32037.14.aps.60.028502

Total dose characteristics of single poly EEPROM and SONOS EEPROM on SOI

CSTR: 32037.14.aps.60.028502
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  • 在自行研发的0.8 μm SOI工艺平台上开发了基于SOI技术的单层多晶硅EEPROM(electrically erasable programmable read only memory)和SONOS (silicon-oxide-nitride-oxide-silicon)EEPROM,并进行了抗总剂量辐照实验研究,分析了各种EEPROM结构在抗总剂量辐照下的失效机理.结果表明基于SOI 技术的SONOS EEPROM具有良好的抗总剂量辐照性能,为抗辐照EEPROM电路中的存储单元结构选取提供了依据.

     

    Devices of single poly electrically ersable programmable read only memory (EEPROM) and silicon-oxide-nitride-oxide-silicon (SONOS) EEPROM on silicon on insulator (SOI) are fabricated on self-built 0.8 μm SOI process. And through a set of experiments on EEPROMs of these configurations and comparisons, SOI SONOS EEPROM is successfully developed with good and stable total dose radiation hardened characteristics. These provide stronger proofs to choose EEPROM in radiation hardened circuits.

     

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