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中国物理学会期刊

Al掺杂ZnO薄膜的厚度对其结构及磁学性能的影响

CSTR: 32037.14.aps.60.067502

Effects of thickness for Al doped ZnO thin films on their microstructure and magnetic properties

CSTR: 32037.14.aps.60.067502
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  • 采用直流磁控共溅的方法在玻璃基底上制备了不同厚度的Al掺杂ZnO薄膜,并在真空和空气中分别退火.利用X射线衍射仪(XRD)和物理性能测量仪(PPMS)对系列薄膜的结构和磁性进行了表征.XRD结果显示:随着膜厚的增加,晶粒尺寸逐渐增大,薄膜的内应力逐渐减小.在空气退火的薄膜样品中观察到了室温的铁磁性,薄膜的饱和磁化强度Ms 随着膜厚的增加而增大,而矫顽力Hc却随着膜厚的增加而减小.

     

    Al doped ZnO films of different thickness have been prepared on glass substrates by dc magnetron sputtering, these films were annealed in different atmosphere . The crystal structures were analyzed by x-ray diffraction (XRD), and the magnetic properties were measured by a Physical Properties Measurement System (PPMS) with the magnetic field paralleled to the films plane. The results indicate that with increase of the thickness, the crystallinity of the thin films gets better and the crystallites of the Al doped ZnO thin films increase gradually, whereas the internal stresses decreased. The results show the films annealed in air shows obvious room temperature ferromagnetism. With the increase of the film thickness the saturation magnetization is enhanced, and the coercivity is weakened.

     

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