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离子辐照半导体可以很好的改善半导体材料的磁学性质.用He+ 辐照Ga0.94Mn0.06As薄膜,可以较方便的调制Ga0.94Mn0.06As 薄膜中产生铁磁性载体的浓度.由于空穴居间而导致Ga0.94Mn0.06As薄膜的铁磁性, 可以通过He+的辐照来得到改善,其结果是Ga0.94Mn0.06As薄膜的矫顽力可以增加3倍多. 当He+辐照流强增加时, 居里温度和沿着样品面外磁化难轴方向的饱和磁场都减小了. 被辐照的Ga0.94Mn0.06As薄膜的电学性质和结构特征显示, He+辐照Ga0.94Mn0.06As薄膜可以有控制地改善它的铁磁性, 其结果源于He+辐照Ga0.94Mn0.06As薄膜所诱导产生电缺陷对空穴的补偿, 而不是He+辐照改变了Ga0.94Mn0.06As薄膜的结构.Ion irradiation of semiconductors is a well understood method to tune the carrier concentration in a controlled manner. We show that the ferromagnetism in Ga0.94Mn0.06As films, known to be hole-mediated, can be modified by He ion irradiation. The coercivity can be increased by more than three times. The magnetization, Curie temperature and the saturation field along the out-of-plane hard axis all decrease as the fluence increases. The electrical and structural characterization of the irradiated Ga0.94Mn0.06As layers indicates that the controlled amending of magnetism results from a compensation of holes by generated electrical defects and not from a structural modification.
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Keywords:
- ion irradiation /
- ferromagnetism /
- magnetoresistance







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