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中国物理学会期刊

分子束外延生长111晶向CdTe的研究

CSTR: 32037.14.aps.61.046802

Study of growth of 111-oriented CdTe thin films by MBE

CSTR: 32037.14.aps.61.046802
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  • 本文采用分子束外延(MBE)方法在BaF2衬底上直接外延生长了CdTe(111)薄膜. 反射高能电子衍射(RHEED)实时监控生长表面, 衍射图样揭示了CdTe(111)在BaF2表面由二维生长向三维生长的变化过程.XRD表征验证了外延生长的CdTe薄膜的单晶性质.由红外透射光谱测量和理论拟合相结合, 得到了CdTe外延薄膜室温带隙宽度Eg=1.511 eV.

     

    In this study, CdTe(111) thin films were epitaxially grown on freshly cleaved BaF2 substrate using molecular beam epitaxy (MBE). In situ characterization of reflection high energy electron diffraction (RHEED) reveals the growth mode of transition from 2D to 3D. XRD analysis results verify the single crystalline property of the as-grown films. Theoretical method is adopted to fit the measured near infrared transmission spectrum, revealing a CdTe energy gap of 1.511 eV at room temperature.

     

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