搜索

x
中国物理学会期刊

界面对ZrN/TaN纳米多层膜固氦性能的影响

CSTR: 32037.14.aps.62.186801

Interface effects on helium retention properties of ZrN/TaN nano-multilayers

CSTR: 32037.14.aps.62.186801
PDF
导出引用
  • 采用射频磁控溅射方法, 在混合气氛下制备了ZrN/TaN多层膜. 利用X射线衍射、慢正电子束分析、增强质子背散射、扫描电子显微镜, 分别对ZrN/TaN多层膜中相结构、氦相关缺陷、氦含量、截面形貌等进行了分析. 结果表明, 调制周期为30 nm的ZrN/TaN多层膜在600℃退火后, 氦的保持率仍能达到45.6%. 在适当的调制周期下, ZrN/TaN多层膜能够耐氦损伤并且其界面具有一定的固氦性能.

     

    In this paper, ZrN/TaN nano-multilayers are fabricated in mixing atmosphere by radio frequency magnetron sputtering. The phase structures, He-related defects, helium content and cross-section morphologies of ZrN/TaN nano-multilayers are characterized by X-ray diffraction, slow positron beam analysis, enhanced proton backscattering spectrome and scanning electron microscope, respectively. The results show that the interface of ZrN/TaN nano-multilayer with 30 nm modulation period is stable and could resist the damage of helium even annealed at 600℃. The He retention rate of ZrN/TaN nano-multilayer with 30 nm modulation period can reach up to 45.6%.

     

    目录

    /

    返回文章
    返回