Niobium-doped TiO2 thin films are deposited on strontium titanate substrates by E-beam evaporation deposition. Effects of post-annealing in hydrogen atmosphere on their optoelectrical properties are studied. The results show that the annealing in hydrogen atmosphere can enhance their conductivity values efficiently. The corresponding optium resistivity reaches 5.46×10-3 Ω·cm, and the transmittance values of the thin films are 60%–80%. The improvement in the conductive performance is attributed to the increase of the grain size of polycrystalline thin film, the formation of a lot of oxygen vacancies and H-doping caused by annealing in hydrogen atmosphere.