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中国物理学会期刊

Ga掺杂对纤锌矿TM0.125Zn0.875O(TM=Be, Mg)电子结构和光学能隙的影响

CSTR: 32037.14.aps.63.087101

Effect on the electronic structures and optical bandgaps of Ga-doped wurtzite TM0.125Zn0.875O(TM=Be, Mg)

CSTR: 32037.14.aps.63.087101
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  • 利用密度泛函理论的平面波超软赝势方法,对纤锌矿TM0.125Zn0.875O(TM=Be,Mg)合金和Ga掺杂TM0.125Zn0.875O的结构参数、能带、电子态密度和光学能隙进行计算和分析. 结果表明:TM0.125Zn0.875O掺入Ga容易实现并且结构更稳定. TM0.125Zn0.875O合金掺Ga 能获得很好的n型材料改性,能隙由导带底Ga 4s 态和价带顶O 2p 态决定. 由于Burstein-Moss移动和多体效应,Ga掺杂后的TM0.125Zn0.875O光学能隙变大,这与实验结果相一致. TM0.125Zn0.875O掺Ga材料可作透明导电薄膜应用到紫外和深紫外光电子器件中.

     

    The optimized structure parameters, electron density of states, energy band structures and optical bandgaps of the TM0.125Zn0.875O (TM=Be, Mg) alloys and Ga-doped TM0.125Zn0.875O are calculated and analyzed by using the ultra-soft pseudopotential approach of the plane-wave based upon density functional theory. The theoretical results show the Ga-doped TM0.125Zn0.875O materials are easily obtained and their structures are more stable. The Ga-doped TM0.125Zn0.875O are good n-type materials and their energy bandgaps are determined by Ga 4s states of the conduction band minimum and O 2p states of the valence band maximum. Compared with the TM0.125Zn0.875O alloys, the optical bandgaps of Ga-doped TM0.125Zn0.875O become wider due to the Burstein-Moss shift and many-body effects, which is consistent with previous experimental data. The Ga-doped TM0.125Zn0.875O materials are suitable as TCO films for the UV and deep UV optoelectronic device.

     

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