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中国物理学会期刊

绝缘体上铌酸锂薄膜片上光子学器件的研究进展

CSTR: 32037.14.aps.69.20200302

Research progress of photonics devices on lithium-niobate-on-insulator thin films

CSTR: 32037.14.aps.69.20200302
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  • 铌酸锂晶体具有卓越的电光和非线性光学性质, 一直以来都被认为是最有前景的集成光子学基质材料之一. 也正是由于铌酸锂晶体多方面优良的光学性能, 近年来新兴的铌酸锂薄膜技术在集成光子学的研究中受到了极大的关注. 借助于先进的微纳加工技术, 许多高性能的铌酸锂集成光子学器件已经得以实现. 本文总结了几种微纳加工技术在基于铌酸锂薄膜的片上光子学器件制备中的应用, 介绍了铌酸锂薄膜片上光子学器件的最新进展, 并展望了其在集成光子学研究中的潜在应用.

     

    Lithium niobate (LiNbO3, LN) crystals have excellent electro-optical and nonlinear optical properties, and they have been regarded as one of the most promising materials for constructing the multifunctional photonic integrated systems. Due to the excellent optical properties of LN crystal, the emerging LN thin film technology has received great attention in the research of integrated photonics in recent years. With the help of advanced micro-nano fabrication technologies, many high-performance lithium niobate integrated photonic devices have been realized.
    Integrated photonic platform can incorporate high-density, multi-functional optical components, micro-nano photonics structures, and optical materials on a monolithic substrate, which can flexibly implement a variety of photonic functions. At the same time, it also provides a low-cost, small-size, and scalable solution for miniaturizing and integrating the free-space optical systems. Photonic chips based on LN have been widely used in fast electro-optic modulation, nonlinear optical frequency conversion and frequency comb generation. In particular, periodically poled lithium niobate (PPLN) based on quasi-phase matching has gradually become a mature integrated photonic platform and has been widely used in the field of nonlinear optics.
    As wafer bonding technology is matured, the lithium-niobate-on-insulator (LNOI) thin films made by the “smart-cut” process have been commercialized. The thickness of the LN film on a Si or SiO2 substrate can reach several hundred nanometers, and good uniformity in film thickness at a larger size (3 inches) can be ensured. With the development of micro-nano fabrication technologies, the quality and functions of photonic devices on LNOI chips have been significantly improved in recent years, and research on integrated photonic devices based on LNOI has also been developed rapidly in recent years.
    In this article we briefly review the development of LNOI technology, introducing the applications of several advanced micro-nano fabrication techniques and summarizing their applications in the micro-/nano-fabrication of on-chip photonic devices based on LNOI wafers. In addition, in this article we also summarize the latest advances in the functionality of LNOI on-chip photonic devices and give a short prospective on their future applications in integrated photonics.

     

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