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中国物理学会期刊

InP中子位移损伤效应的Geant4模拟

CSTR: 32037.14.aps.71.20211722

Geant4 simulation of neutron displacement damage effect in InP

CSTR: 32037.14.aps.71.20211722
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  • 磷化铟(InP)作为第二代化合物半导体材料, 抗辐照能力强, 光电转换效率高, 在光子领域和射频领域具有优势. 大气空间中, InP半导体器件受大气中子辐照影响, 器件性能发生退化. 本文采用蒙特卡罗模拟软件Geant4对InP中子辐照效应进行模拟, 得到InP中不同能量中子产生的位移损伤初态分布. 结果表明: 在微米量级内, 非电离能量损失(NIEL)随深度均匀分布, 在厘米及更高量级上, NIEL随着入射深度的增大而降低, 当靶材料足够厚时可以降低至零; 分析1—20 MeV中子入射3 μm InP产生的NIEL及其随深度分布, 发现NIEL随入射中子能量的增加呈现出先升后降的趋势, 该趋势主要由非弹性散射反应产生的初级反冲原子(PKA)造成; 分析1—20 MeV中子入射3 μm InP产生的PKA种类、能量, 发现In/P的PKA占比较大, 是产生位移损伤的主要因素, 中子能量越高, PKA的种类越丰富, PKA最大动能越大, 但PKA主要分布在低能部分. 研究结果对InP基5G器件在大气中子辐射环境中的长期应用具有理论和指导价值.

     

    As the second-generation compound semiconductor material, indium phosphide (InP) has strong irradiation resistance and high photoelectric conversion efficiency. It has advantages in the field of photonics and radio frequency. In atmospheric space, high-energy cosmic rays enter into the earth’s atmosphere and interact with nitrogen (N), oxygen (O) and other elements to produce secondary cosmic rays. The irradiation particles in the atmosphere are mainly neutrons because the penetration of charged particles is weak. The InP semiconductor devices are affected by atmospheric neutron irradiation of various energy from all directions, which results in the internal defects in InP crystals, the degradation of device performance and the reduction of device lifetime. In this paper, Monte Carlo simulation software Geant4 is used to simulate the neutron irradiation effect, and the initial state distribution of displacement damage caused by neutrons with different energy is obtained, including the distribution of non-ionized energy loss (NIEL) with depth, the relationship between NIEL and the energy of incident neutrons, and the type, number and energy of primary knock-on atoms (PKA). The results show that 1) the NIEL is uniformly distributed when material thickness is on the order of μm and for the material thickness on the order of cm and more, the NIEL decreases as the depth increases and can be reduced to zero when the target material is thick enough; 2) by analyzing the NIEL produced by 1–20 MeV neutrons incident on 3-μm InP and their distribution with depth, it is found that the NIEL first increases and then decreases with incident neutron energy increasing. This trend is caused mainly by PKA produced through the inelastic scattering reaction; 3) by analyzing the type and the energy of PKA produced by 1–20 MeV neutrons incident on 3 μm InP, it is found that the PKA of In/P accounts for a large proportion, which causes displacement damage mainly, and the higher the neutron energy, the richer the variety of PKA is and the greater the maximum kinetic energy of PKA, but the PKAs mainly distribute in the low energy part. The present research has theoretical and guiding value for the long-term application of InP-based 5G devices in atmospheric neutron irradiation environment.

     

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