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中国物理学会期刊

薄膜厚度对射频磁控溅射\boldsymbol\beta-Ga2O3薄膜光电性能的影响

CSTR: 32037.14.aps.71.20211744

Effect of film thickness on photoelectric properties of \boldsymbol\beta -Ga2O3 films prepared by radio frequency magnetron sputtering

CSTR: 32037.14.aps.71.20211744
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  • 本文在室温下利用射频磁控溅射技术在(001)蓝宝石衬底上制备了不同厚度的β-Ga2O3薄膜, 随后将其置于氩气气氛中800 ℃退火1 h. 利用XRD, SEM, UV-Vis分光光度计、PL光致发光光谱仪和Keithley 4200-SCS半导体表征系统等考察薄膜厚度对所得氧化镓薄膜相组成、表面形貌、光学性能以及光电探测性能的影响.结果表明, 随着薄膜厚度的增加, 薄膜结晶质量提高, 840 nm薄膜最佳, 1050 nm薄膜结晶质量略有降低. 不同厚度β-Ga2O3薄膜在波长200—300 nm日盲区域内均具有明显的紫外光吸收, 禁带宽度随着薄膜厚度的增加而增加. PL谱中各发光峰峰强随着薄膜厚度的增加而减小, 表明氧空位及其相关缺陷受到抑制. 在β-Ga2O3薄膜基础上制备出日盲紫外光电探测器的探测性能(光暗电流比, 响应度, 探测率, 外量子效率)也随薄膜厚度的增加呈先增后减的趋势. 厚度约为840 nm的β-Ga2O3紫外光电探测器, 在5V偏压下, 表现出极低的暗电流(4.9 × 10–12 A), 以及在波长254 nm (600 μW/cm2) 紫外光照下, 表现出较高的光暗电流比(3.2 × 105), 较短的响应时间0.09/0.80 s (上升时间), 0.06/0.53 s (下降时间), 其响应度、探测率和外量子效率分别为1.19 mA/W, 1.9 × 1011 Jones和0.58%, 且其光电流随光功率密度和偏置电压的增加几乎呈现线性增加, 可以用于制作日盲紫外探测器.

     

    In this work, β-Ga2O3 films with different thickness are prepared on (001) sapphire substrates at room temperature by the radio frequency magnetron sputtering technology, then the samples are annealed in an Ar atmosphere at 800 ℃ for 1h. The effects of film thickness on the phase composition, surface morphology, optical property, and photoelectric detection performance are investigated using XRD, SEM, UV-Vis spectrophotometer, PL photoluminescence spectrometer, and Keithley 4200-SCS semiconductor characterization system. The results show that as the film thickness increases, the film crystallinity is improved, films with a thickness of 840 nm exhibit best quality, while those with a thickness of 1050 nm declines a little in quality. The β-Ga2O3 films with different thickness exhibit obvious ultraviolet light absorption in the solar-blind region with wavelengths of 200–300 nm, and the bandgap width increases with the film thickness increasing. All the β-Ga2O3 films show a broad UV-green light emission peaks in a wavelength range of 350–600 nm. As the film thickness increases, the intensities of the emission peaks of ultraviolet, violet, and blue light are greatly reduced, indicating that oxygen vacancy-related defects (VO, VGaVO) are greatly suppressed with film thickness increasing. Solar-blind ultraviolet photodetector is fabricated based on the β-Ga2O3 film. Its photoelectric detection performances (the photo-to-dark current ratio, responsivity, detectivity, and external quantum efficiency) also increase first and decrease then with the increase of film thickness. The β-Ga2O3 ultraviolet photodetector prepared by a thin film with a thickness of 840 nm exhibits a very low dark current (4.9 × 10–12 A) under a 5 V bias voltage and an ultraviolet light with a wavelength of 254 nm (600 μW/cm2). It exhibits a high photo-to-dark current ratio of 3.2 × 105, and a short response time of 0.09/0.80 s (rising time) and 0.06/0.53 s ratio (falling time). Its responsivity (R), detectivity (D *), and the external quantum efficiency (EQE) are 1.19 mA/W, 1.9 × 1011 Jones, and 0.58%, respectively. The prepared device has quantifiable characteristics, and its photocurrent increases almost linearly with the increase of applied voltage and optical power density, and therefore can work in a linear dynamic region, which indicates that it is very suitable for fabricating the solar-blind ultra-violet detectors.

     

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