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高性能热电材料的发展有望帮助解决未来能源危机, 且随着可穿戴器件的发展与应用, 热电材料和器件除了要具备更高的热-电转化性能以外, 还必须具有良好的柔性. 将热电材料制成薄膜既可以为微型器件供电, 也有潜力应用于柔性器件. 本文使用脉冲激光沉积方法, 在商用SrTiO3 (STO)和La0.3Sr0.7Al0.65Ta0.35O3 (LSAT)衬底上制备得到了不同厚度的高质量铌掺杂钛酸锶薄膜(Nb:STO), 并对薄膜的表面形貌、结构以及热电性能进行表征与测试. 结果显示, 使用LSAT作为衬底可以对薄膜施加面内压应变, 随着薄膜厚度的增大, 应变逐渐释放并接近于块体Nb:STO. 随着厚度的增大, 薄膜的热电性能逐渐提升, 在STO衬底上生长的208 nm厚样品的室温功率因子相比于52 nm样品提升了187%. 此外, 144 nm厚度的Nb:STO/LSAT薄膜室温塞贝克系数达到了265.95 μV/K, 这是由于衬底应变导致薄膜样品的能带变化. 本工作表明通过应变工程调控铌掺杂钛酸锶薄膜热电性能的可行性, 为后续提高此类薄膜材料的热电性能提供了一种新思路.The development of high-performance thermoelectric materials can help solve the energy crisis in the future. Thin-film thermoelectric materials can meet the requirement for flexibility of wearable devices while supplying electrical power to them. In this study, high-quality Nb-doped SrTiO3 films (Nb:STO) with different thickness are prepared on SrTiO3 (STO) and La0.3Sr0.7Al0.65Ta0.35O3 (LSAT) substrates by pulsed laser deposition. The surface morphologies, crystal structures, and thermoelectric performances of the films are characterized. The results show that the thermoelectric performance of the strain-free film increase with thickness increasing. The power factor at room temperature increases by 187%. The Seebeck coefficient of the 144 nm-thick Nb:STO/LSAT sample with strain is greatly improved to
265.95\;\textμ\rmV/\rmK at room temperature, which is likely to be due to the strain induced changes in the energy band of the thin film. The improvement of the thermoelectric performances of Nb:STO thin films by strain engineering provides a new approach to improving the thermoelectric properties of oxide thin films.-
Keywords:
- pulsed laser deposition /
- thermoelectricity /
- SrTiO3 /
- thin film









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