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中国物理学会期刊

超晶格电子阻挡层周期数对AlGaN基深紫外发光二极管性能的影响

CSTR: 32037.14.aps.73.20231969

Influence of period number of superlattice electron barrier layer on the performance of AlGaN-based deep ultraviolet LED

CSTR: 32037.14.aps.73.20231969
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  • 在AlGaN基深紫外发光二极管(DUV-LEDs)中设计了具有不同周期数的超晶格电子阻挡层(SL-EBL)结构, 研究了SL-EBL周期数对DUV-LEDs发光效率、I-V特性、可靠性及有源区载流子复合机制的影响. 研究结果表明, 随着SL-EBL的周期数增加, DUV-LEDs的光输出功率(LOP)、外量子效率(EQE)和电光转换效率 (WPE)均呈先上升后下降的趋势, 同时泄漏电流减小, 可靠性提升. 当周期数为7时(厚度为28 nm), DUV-LEDs裸芯的EQE和WPE均达到最大值, 在7.5 mA注入电流下分别为3.5%和3.2%. 能带模拟结果证明了增加SL-EBL周期数可以有效提升电子势垒高度, 而几乎不改变空穴势垒高度. 然而, 当SL-EBL超过一定厚度时, 抑制了空穴向有源区的注入, 导致EQE和WPE随SL-EBL周期数变化出现拐点. 研究了SL-EBL周期数对DUV-LEDs载流子复合机制的影响, 发现增加SL-EBL周期数可以有效地降低有源区内载流子非辐射复合.

     

    The development of AlGaN-based deep ultraviolet light emitting diodes (DUV-LEDs) is currently limited by poor external quantum efficiency (EQE) and wall-plug efficiency (WPE). Internal quantum efficiency (IQE), as an important component of EQE, plays a crucial role in improving the performance of DUV-LEDs. The IQE is related to the carrier injection efficiency and the radiation recombination rate in the active region. In order to improve the IQE of AlGaN-based DUV-LEDs, this work proposes a scheme to optimize the period number of superlattice electron barrier layer (SL-EBL) to achieve better carrier injection efficiency and confinement capability. The effect of the period number of SL-EBL on the luminous efficiency, reliability and carrier recombination mechanism of AlGaN-based DUV-LEDs with an emission wavelength of 273 nm are investigated. The experimental results show that the light output power (LOP), external quantum efficiency (EQE) and wall-plug efficiency (WPE) of the DUV-LEDs tend to first increase and then decrease with the period number of SL-EBL increasing, while the leakage current decreases and the reliability is enhanced. The maximum EQE and WPE of the DUV-LED are 3.5% and 3.2%, respectively, at an injection current of 7.5 mA when the period number of SL-EBL is fixed at 7 (the thickness is 28 nm). Meanwhile, the numerical simulation results show that the electron potential barrier height is enhanced with the period number of SL-EBL increasing, and the variation of the hole potential barrier height is negligible. Therefore, increasing the period number of SL-EBL is beneficial to shielding the dislocations and suppressing the leakage of electrons into the p-type layer, which improves the luminous efficiency and reliability of DUV-LEDs. However, when the period number of SL-EBL exceeds 7, the excessively thick hole potential barrier prevents the holes from entering into the activation region and reduces the radiative recombination efficiency. Therefore, EQE and WPE will show an inflection point with the variation of the period number of SL-EBL. In addition, to investigate the carrier recombination mechanism of the active region, the experimental EQE curves are fitted by the ABC model as well as the different slopes in logarithmic light output power-current (L-I ) curves are calculated after aging. It can be found that increasing the period number of SL-EBL can effectively suppress the non-radiative combination of carriers in the active region. This investigation can provide an alternative way to enhance the photoelectric performance of DUV-LEDs.

     

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