Dual-wavelength lasers in the extreme ultraviolet (EUV) band can be utilized in many fields such as high-resolution imaging, EUV nonlinear optics, and high-density plasma diagnostics. In this work, dual-wavelength lasers at 46.9 nm and 69.8 nm from Ne-like Ar (Ar⁸⁺) ions pumped by capillary discharge are obtained. In order to change the amplitude of the main pulse current over a wide range, several parameters of the main pulse power supply such as charging voltage of the Marx generator, the conduction voltage of the spark gap switch, and the conductivity of the deionized water in the Blumlein transmission line, are adjusted to vary the amplitude of the main pulse current from 8.4 to15.8 kA. On this basis, the influences of the initial argon pressure and the main pulse current amplitude on the intensities of 46.9 nm and 69.8 nm lasers are studied. The experimental results show that there exists an optimal pressure for each main pulse current amplitude. The optimal pressure for 69.8 nm laser is lower than that for the 46.9 nm laser. Based on the variation of laser intensity with initial pressure and main pulse current amplitude, the optimal experimental parameters for the 46.9 nm laser are a current of 10.9 kA and an initial pressure of 18.1 Pa, and those for the 69.8 nm laser are a current of 14.5 kA and an initial pressure of 18.5 Pa. When the main pulse current amplitude is 14.5 kA and the initial pressure is 18.5 Pa, dual-wavelength lasers at both strong 46.9 nm and 69.8 nm can be generated. The different influencing rules of initial pressure and main pulse current on the 46.9 nm and 69.8 nm lasers can guide other research groups in exploring the possibility of achieving 69.8 nm laser operation by using the existing 46.9 nm laser device. Meanwhile, the research on the optimal parameters of 46.9 nm and 69.8 nm lasers is beneficial for enhancing laser energy and expanding their application fields. One of future studies will focus on the applications of the dual-wavelength laser in the sum frequency and difference frequency of EUV lasers.