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中国物理学会期刊

基于双层VSi2P4多铁隧道结的隧穿磁阻和电致电阻研究

Tunneling magnetoresistance and electroresistance in multiferroic tunnel junctions based on bilayer VSi2P4

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  • 新型二维材料MA2Z4体系因其结构和材料的多样性受到了很大的关注。其中,双层VSi2P4在AB和BA堆叠情形下同时具有面外铁电极化和层间反铁磁耦合,具有广泛的应用前景。本文基于密度泛函理论和非平衡格林函数研究了双层VSi2P4范德瓦尔斯多铁器件在不同电极、界面耦合以及结构不对称情况下自旋输运特性。结果表明,双层VSi2P4的自旋过滤特性导致了Au-VSi2P4-Au器件和TiSe2-VSi2P4-TiSe2器件相对较大的隧穿磁阻,电极和势垒层的界面耦合造成了相对较小的电致电阻。通过引入MoTe2插层,Au-MoTe2-VSi2P4-MoTe2-Au器件的电致电阻达到17.35%和17.90%,TiSe2-MoTe2-VSi2P4-MoTe2-TiSe2器件电致电阻达到46.25%和49.30%。在不对称电极Au-MoTe2-VSi2P4-MoTe2-TiSe2器件中,电致电阻进一步扩大至95.3%和94.0%,同时隧穿磁阻保持相对较大。这些研究成果有望推动二维本征多铁隧道结以及相关存算一体器件发展。

     

    The novel two-dimensional MA2Z4 family has attracted significant attention due to its diverse structures and material properties. Among these, the bilayer VSi2P4 exhibits simultaneous out-of-plane ferroelectric polarization and interlayer antiferromagnetic coupling in both AB and BA stacking configurations, offering promising prospects for various applications. In this work, based on density functional theory combined with non-equilibrium Green's functions, we investigate the spin transport properties of van der Waals multiferroic devices based on bilayer VSi2P4,  considering different electrodes, interfacial coupling, and structural asymmetry. The results show that the spin-filtering effect of bilayer VSi2P4 leads to relatively large tunneling magnetoresistance in both Au-VSi2P4-Au and TiSe2-VSi2P4-TiSe2 devices, while the interfacial coupling between electrodes and the barrier layer results in relatively small tunneling electroresistance. By introducing a MoTe2 interlayer, the tunneling electroresistance of the Au-MoTe2-VSi2P4-MoTe₂-Au device reaches 17.35% and 17.90%, and that of the TiSe2-MoTe2-VSi2P4 -MoTe2-TiSe2 device reaches 46.25% and 49.30%. In the Au-MoTe2-VSi2P4-MoTe2-TiSe2 device with asymmetric electrodes, the tunneling electroresistance is further enhanced to 95.3% and 94.0%, while the tunneling magnetoresistance remains relatively large. These findings are expected to advance the development of two-dimensional intrinsic multiferroic tunnel junctions and related in-memory computing devices.

     

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