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中国物理学会期刊

非晶TbCo/Si多层膜的磁性和磁光特性

CSTR: 32037.14.aps.48.224

The Magnetic and Magneto-Optic Properties of the Amorphous TbCo/Si Multilayers

CSTR: 32037.14.aps.48.224
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  • 利用射频磁控溅射方法制备了非晶TbCo/Si多层膜,并对多层膜的磁性和磁光特性进行了测量.实验发现,随着Si层厚度的增加,非晶TbCo/Si多层膜的饱和磁化强度Ms、垂直各向异性常数Ku、磁光克尔角θK都显著下降.分析认为这是由于在TbCo层与Si层之间的层间互扩散形成了非磁性的Co2Si所致.

     

    The Tb0.17Co0.83/Si multilayers prepared by a rf magnetron sputtering system with different Si thickness have been investigated. X-ray diffraction, magnetic measurement and Kerr rotation have been performed. With increasing thickness of Si layer tSi, the perpendicular anisotropy constant Ku decreased rapidly. The saturation magnetization Ms and the Kerr rotation θK decreased linearly when tSi increased. It was assumed that Co2Si and Tb had been formed in the interfacial zone between TbCo and Si layers. The reduction of Ku, Ms and θK is attributed to the decrease of the effective thickness of magnetic layer, which is linear with tSi.

     

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