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中国物理学会期刊

脉冲激光制膜过程中等离子体演化规律的研究

CSTR: 32037.14.aps.52.242

Study on the evolvement of plasma generated by pulsed laser deposition of thin film

CSTR: 32037.14.aps.52.242
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  • 利用有限差分法对脉冲激光沉积(PLD)技术制备KTa065Nb035O3(KTN)薄膜过程中等离子体在等温和绝热两个阶段的速度演化进行了模拟,并给出了其中主要粒子在空间的具体演化规律,对等离子体在空间膨胀的物理机制,进行了深入的讨论,给出了相应演化过程的物理图像,并揭示了等离子体羽辉在膨胀过程中呈现椭球外形的内在原因.

     

    By finite difference method, the evolvement of plasma generated by a pulsed laser is studied for pulsed laser deposition of KTa065Nb035O3(KTN) thin film. We have discussed the movement of particles in plasma in isothermal and adiabatic expansion stages in more detail. At the same time, we have simulated the change of figure of plasma at different time. Moreover, the physics mechanism in expansion of the plasma have been explained. The theoretical results are compared with our experiments and other author's conclusions.

     

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