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中国物理学会期刊

快中子辐照直拉硅中受主和施主的研究

CSTR: 32037.14.aps.54.1783

Investigation of the acceptor and donor in fast neutron irradiated Czochralski s ilicon

CSTR: 32037.14.aps.54.1783
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  • 通过傅里叶红外光谱、正电子湮没寿命谱和Hall技术研究了高剂量快中子辐照直拉硅的辐照 缺陷、电阻率、载流子迁移率、载流子浓度随退火温度的变化.经快中子辐照,直拉硅样品 的导电类型由n型转变为p型.在450和600℃热处理出现两种受主中心,分别由V22O22,V22O,VO22,V-O-V及V44型缺 陷引起,这些缺陷态的出现使得样品中空穴浓度迅速增加;大于650℃热处理这些受主态 缺陷迅速消失,

     

    Variations of the irradiated defects, resistivity, carrier mobility ratio and ca rrier concentration in high-dose neutron-irradiated n-type Czochralski silico n have been investigated by means of Fourier transform infrared spectrometer, po sitron annihilation spectroscopy and Hall effect. After irradiated with fast neu tron, the sample transformed from n to p-type. Two types of acceptor centers th at contribute to the V22O22, V22O, VO22, V-O-V and V 44-type defects will appear after annealing at temperature of 450 a nd 600 ℃, respectively. After annealing at temperatures above 650℃, with the elimin ation of acceptors, the carrier mobility ratio and the carrier-type began to re cover and a type of donor related to the irradiated defects will appear. The eff ective annealing temperature is 750℃ at which the donor is formed, and anneal ing above 900℃ for 1h will eliminate the donor.

     

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