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多层膜[Co85Cr15/Pt]20的磁性、垂直磁记录特性和微结构的关系

黄 阀 李宝河 杨 涛 翟中海 朱逢吾

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多层膜[Co85Cr15/Pt]20的磁性、垂直磁记录特性和微结构的关系

黄 阀, 李宝河, 杨 涛, 翟中海, 朱逢吾

Correlation among magnetic properties, perpendicular magnetic recording properti es and microstructure of[Co8585Cr1515/Pt]2020 multilayers

Hwang Pol, Li Bao-He, Yang Tao, Zhai Zhong-Hai, Zhu Feng-Wu
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  • 采用磁控溅射法制备了性能优良的以Pt为缓冲层的[Co8585Cr1515/Pt]2020 多层膜,研究了溅射气压对[Co8585Cr1515/Pt]2020多层膜微结构和磁性的 影响.研究结果表明,Ar溅射气压对[Co8585Cr1515/Pt]2020多层膜的微结构 、垂直磁各向异性和矫顽力有重要的影响
    The [Co8585Cr1515/Pt]2020 multilayers w ith Pt underlayers were prepared by magnetron sputtering and the effects of sputtering Ar gas pressure on m icrostructure and magnetic properties of [Co8585Cr1515 /Pt]2020 mul tilayers were studied. The results show that sputtering Ar gas pressure has a gr eat effect on the microstructure, perpendicular magnetic anisotropy and the coer civity of [Co8585Cr1515/Pt]2020 mul tilayers. For all samples, we have the effective magnetic anisotropy constant K effeff>0, and all s amples showed perpendicular magnetic anisotropy. With increasing sputtering Ar g as pressure, the perpendicular and in-plane coercivity of the samples increase, but the effective magnetic anisotropy constant decreases. The coercivity of Pt( 20nm)/[(Co8585Cr1515(05nm)/Pt(15nm)]2020 multilayers spu tter-depositied at 16Pa Ar gas pressures is increased to 130kA/m. The Pt( 20nm)/[(Co8585Cr1515(05nm)/Pt(15nm)] 2020 multilayers display perpendicular magnetic anisotropy and can be used as perpendicular magn etic recording media. The images of atomic force microscopy show that both avera ge grain size and the surface roughness increase with increasing sputtering Ar p ressure, which leads to the enhancement of perpendicular coercivity and the decr ease of effective magnetic anisotropy constant.
    • 基金项目: 国家自然科学基金(批准号:50301002)和北京市科技新星计划(批准号:H020821290120 )资助的课题.
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  • 文章访问数:  4217
  • PDF下载量:  930
  • 被引次数: 0
出版历程
  • 收稿日期:  2004-09-21
  • 修回日期:  2004-11-01
  • 刊出日期:  2005-02-05

多层膜[Co85Cr15/Pt]20的磁性、垂直磁记录特性和微结构的关系

  • 1. (1)北京科技大学材料物理与化学系,北京 100083; (2)北京科技大学材料物理与化学系,北京 100083;北京工商大学数理部,北京 100037; (3)北京科技大学材料物理与化学系,北京 100083;金日成综合大学物理系,朝鲜平壤
    基金项目: 

    国家自然科学基金(批准号:50301002)和北京市科技新星计划(批准号:H020821290120 )资助的课题.

摘要: 采用磁控溅射法制备了性能优良的以Pt为缓冲层的[Co8585Cr1515/Pt]2020 多层膜,研究了溅射气压对[Co8585Cr1515/Pt]2020多层膜微结构和磁性的 影响.研究结果表明,Ar溅射气压对[Co8585Cr1515/Pt]2020多层膜的微结构 、垂直磁各向异性和矫顽力有重要的影响

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