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中国物理学会期刊

退火温度对Er/Yb共掺Al2O3薄膜的光致荧光光谱的影响

CSTR: 32037.14.aps.54.4433

Influence of annealing temperature on the luminescence of Er/Yb co-doped Al2O3 films

CSTR: 32037.14.aps.54.4433
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  • 通过对不同退火条件下Er/Yb共掺Al2O3薄膜光致荧光(PL)光谱的 系统分析,研究了高Er/Yb掺杂浓度所导致的晶体场变化对薄膜PL光谱的影响,并结合薄膜结构分析,探讨了Al2O3薄膜的结晶状态在Er3+激活、PL光谱宽化 中的作用及可能的物理机理.研 究结果表明:退火处理所导致的Er3+ PL光谱的变化与薄膜的微观状态之 间有着密 切的联系.在600—750℃范围内,薄膜呈非晶态结构,薄膜荧光强度的增加主要是薄膜内缺 陷减少所致;在800—900℃范围内,γ-Al2O3相的出现是导致荧 光强度明显增加的主 要原因;当退火温度为1000℃时,Er,Yb的大量析出致使荧光强度的急剧下降.此外,对PL 光谱线形分析表明,各子能级跃迁的相对强度变化是导致荧光光谱宽化的主要因素.

     

    The influence of annealing temperature on the photo-luminescence (PL) of high co ncentration Er/Yb co-doped Al2O3 films was studied. The relationship betwe en PL spectra and microstructure of the films at various annealing temperatures was revealed by analyzing the dependence of the intensity and the full width at half-maximum of the PL spectra on the annealing temperature. The PL measurement shows that the annealing behavior may be split into three different regimes. Bel ow 750℃, the intensity increases with the increase of annealing temperature wit h a small slope, which corresponds to the amorphous Al2O3 films. Between 800℃ and 900℃, the PL intensity increases considerably, where the microstructure of the films was identified to be composed of γ-Al2O3 grains in nano-meter scale; At the temperature of 1000℃, the intensity of PL spectrum decre ases to a very low level, γ-Al2O3 grains and the segreg ation of Er2O 3 and Yb2O3 phases were observed by using transmis sion electron microscopy . Furthermore, the dependence of PL spectrum shape on the PL intensity of sub-le vel transition was analyzed and discussed by fitting the PL spectra at various t emperatures.

     

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