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立方氮化硼薄膜的光学带隙

邓金祥 汪旭洋 姚 倩 周 涛 张晓康

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立方氮化硼薄膜的光学带隙

邓金祥, 汪旭洋, 姚 倩, 周 涛, 张晓康

Optical band gap of cubic boron nitride thin films deposited by sputtering

Deng Jin-Xiang, Wang Xu-Yang, Yao Qian, Zhou Tao, Zhang Xiao-Kang
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  • 用射频溅射法在p型Si(100)衬底上沉积立方氮化硼(c-BN)薄膜,薄膜的成分由傅里叶变换红外谱标识,用紫外-可见分光光度计测量了c-BN薄膜的反射光谱,利用K-K(Kramers-Kroning)关系从反射谱计算出c-BN薄膜的光吸收系数,进而确定c-BN薄膜的光学带隙.对于立方相含量为55.4%的c-BN薄膜,光学带隙为5.38eV.
    Cubic boron nitride thin films were deposited on silicon (100) substrates by sputtering. The films were characterized by Fourier transform infrared (FTIR) spectroscopy. The reflectance R(λ) of the films was obtained as a function of incident photon wavelengths and the thickness of the films was measured by Alpha-step. Using Kramers-Kronig transform and the reflectance spectrum R(λ), we calculated the absorption coefficient. The optical band gap was found to be 5.38eV for the films containing 55.4% of cubic phase.
    • 基金项目: 北京市自然科学基金(批准号:4072007),国家自然科学基金(批准号:60376007)和北京市属市管高等学校人才强教计划资助的课题.
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  • 文章访问数:  8500
  • PDF下载量:  1526
  • 被引次数: 0
出版历程
  • 收稿日期:  2008-02-04
  • 修回日期:  2008-04-01
  • 刊出日期:  2008-05-05

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