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中国物理学会期刊

带隙可调的Al,Mg掺杂ZnO薄膜的制备

CSTR: 32037.14.aps.58.7199

Preparation of Mg and Al co-doped ZnO thin films with tunable band gap

CSTR: 32037.14.aps.58.7199
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  • 利用射频磁控溅射(RF-MS)方法,固定Al2O3掺杂量2 wt%,Mg掺杂量分别为1 wt%,3 wt%和5 wt%,在玻璃基底上制备了Al掺杂和Al,Mg共掺杂的ZnO薄膜,在500 ℃空气中退火2 h后,测量并比较了它们的光学和电学性质.结果表明,Al,Mg共掺杂的ZnO薄膜结晶质量良好,具有ZnO纤锌矿结构,具有较强的(002)面衍射峰,表明薄膜晶体沿c轴优先生长;与Al掺杂ZnO薄膜相比蓝端光透射率增加,1 wt%和3 wt% Mg掺杂薄

     

    Al (Al2O3,2wt%) doped ZnO thin films (ZAO) with tunable band gap,alloyed with different Mg contents (1wt%,3wt% and 5wt%),were prepared by radio frequency magnetron sputtering on glass substrates and annealed at 500℃ in air. The optical and electrical properties of the films were measured by X-ray diffractometer,four-point probe method,Hall-effect configuration,and UV-VIS spectrophotometer. The results show that the Mg co-doped ZAO thin films have a wurtzite structure with (002) preferred orientation. Compared with ZAO film,the optical transmission of Mg co-doped ZAO thin films in the ultraviolet region increases and the average optical transmissions in the visible region is greater than 85%,except the 5wt% Mg doped films. The band gaps of ZAO and Mg co-doped ZAO thin films can be modulated from 344 eV to 351 eV by increasing the Mg content from 1wt% to 5wt%. For 1wt%,3wt% and 5wt% Mg doping,the Mg co-doped ZAO thin films have the resistivity of 12×10-3,37×10-3 and 85×10-3 Ω·cm,respectively. Stokes shifts of 20,14 and 50 meV were observed for doping of 1wt%,3wt%,and 5wt% Mg contents. We find that a large Mg doping content will degrade the crystal quality of Mg co-doped ZAO thin films,decrease the optical transmissions in the visible region and decrease the carrier mobility in the films. Therefore,the resistivity of Mg co-doped ZAO thin films increases with the Mg doping content.

     

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