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中国物理学会期刊

Si基外延Ru2Si3电子结构及光学性质研究

CSTR: 32037.14.aps.59.2027

First-principles study on the band structure and optical properties of strained Ru2Si3 semiconductor

CSTR: 32037.14.aps.59.2027
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  • 采用基于第一性原理的赝势平面波方法,对异质外延关系为Ru2Si3 (100)//Si(001),取向关系为Ru2Si3[010]//Si[110]正交相的Ru2Si3平衡体系下的能带结构、态密度和光学性质等进行了理论计算.计算结果表明:当晶格常数a取值为1093 nm时,正交相Ru2Si3处于稳定状态并且是具有带隙值

     

    We calculated the band structure, density of states and optical properties of semiconductor material Ru2Si3 epitaxial-grown on Ru2Si3 (100)//Si(001) with Ru2Si3[010]//Si[110] by using the pseudo-potential plane wave method based on first principles methods. As shown by the calculated results, orthorhombic Ru2Si3 is not only a direct semiconductor with the band gap of 0773 eV, but also in stable condition when the lattice parameter a is 1093 nm.The valence bands of Ru2Si3 are mainly composed of Ru 4d and the conduction bands are mainly composed of Ru 3d and Si 3p. Its static dielectric function ε1(0) is 1891, the refractive index n0 is 4349

     

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