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The volume absorptions and the interface absorptions of SiO2 and HfO2 single layers are studied using the thermal lens method. Based on the fact that electric field distributions in single layers are different when the films are illuminated from the coating side and substrate side, an equation is given to calculate volume and interface absorptions of single layers. Half wave HfO2 and SiO2 single layers are prepared by electron beam evaporation method. With the absorption data measured by thermal lens technique, we separate the volume absoption from the interface absorption for these two single layers. The results show that interface absorption is non negligible when the absorption of film approaches to a ppm level. Additionally, the HfO2 single layer shows bigger volume and interface absorptions than SiO2 single layer.
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Keywords:
- standing-wave theory /
- thermal lens /
- film absorption /
- extinction coefficient
[1] Ephstein E M 1970 Sov. Phys. JETP 41 2213
[2] Chow R, Taylor J R, Wu Z L 2000 Appl. Opt. 39 650
[3] Li B C, Martin S, Welsch E 1999 SPIE 3902 145
[4] Wu Z L, Fan Z X 1989 Acta Opt. Sin. 9 630 (in Chinese) [吴周令、范正修 1989 光学学报 9 630]
[5] Commandré M, Rolhe P, Borgogno J P, Albrand J 1994 Optical Interference Coatings, Proc. Soc. Photo-Opt. Instrum. 2253 1253
[6] Temple P A 1979 Appl. Phys. Lett. 34 677
[7] Welsch E, Walther H G, Kühn H J 1987 J. Physique 48 419
[8] Lehan J P, Mao Y, Bovard B G, Macleod H A 1991 Thin Solid Films 203 227
[9] Borgogno J P, Flory F, Roche P, Schmitt B, Albrand G, Pelletier E, Macleod H A 1984 Appl. Opt. 23 3567
[10] Bubenzer A, Koidl P 1984 Appl. Opt. 23 2886
[11] Power J F 1990 Appl. Opt. 29 52
[12] Fan S H, He H B, Shao J D, Fan Z X, Zhao Y A 2006 Acta Phys. Sin. 55 758 (in Chinese) [范树海、贺洪波、邵建达、范正修、赵元安 2006 物理学报 55 758]
[13] Guntau M, Triebel W 2006 Review of Scientific Instruments 71 2279
[14] Li B C, Xiong S M, Blaschke H, Ristau D 2006 Chinese Journal of Lasers 33 823 (in Chinese) [李斌成、熊盛明、Holger Blaschke、Detlev Ristau 2006 中国激光 33 823]
[15] Dijon J, Rafin B, Pellé C 2000 Proc. SPIE 3902 158
[1] Ephstein E M 1970 Sov. Phys. JETP 41 2213
[2] Chow R, Taylor J R, Wu Z L 2000 Appl. Opt. 39 650
[3] Li B C, Martin S, Welsch E 1999 SPIE 3902 145
[4] Wu Z L, Fan Z X 1989 Acta Opt. Sin. 9 630 (in Chinese) [吴周令、范正修 1989 光学学报 9 630]
[5] Commandré M, Rolhe P, Borgogno J P, Albrand J 1994 Optical Interference Coatings, Proc. Soc. Photo-Opt. Instrum. 2253 1253
[6] Temple P A 1979 Appl. Phys. Lett. 34 677
[7] Welsch E, Walther H G, Kühn H J 1987 J. Physique 48 419
[8] Lehan J P, Mao Y, Bovard B G, Macleod H A 1991 Thin Solid Films 203 227
[9] Borgogno J P, Flory F, Roche P, Schmitt B, Albrand G, Pelletier E, Macleod H A 1984 Appl. Opt. 23 3567
[10] Bubenzer A, Koidl P 1984 Appl. Opt. 23 2886
[11] Power J F 1990 Appl. Opt. 29 52
[12] Fan S H, He H B, Shao J D, Fan Z X, Zhao Y A 2006 Acta Phys. Sin. 55 758 (in Chinese) [范树海、贺洪波、邵建达、范正修、赵元安 2006 物理学报 55 758]
[13] Guntau M, Triebel W 2006 Review of Scientific Instruments 71 2279
[14] Li B C, Xiong S M, Blaschke H, Ristau D 2006 Chinese Journal of Lasers 33 823 (in Chinese) [李斌成、熊盛明、Holger Blaschke、Detlev Ristau 2006 中国激光 33 823]
[15] Dijon J, Rafin B, Pellé C 2000 Proc. SPIE 3902 158
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