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离子束溅射制备Nb2O5光学薄膜的特性研究

袁文佳 章岳光 沈伟东 马群 刘旭

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离子束溅射制备Nb2O5光学薄膜的特性研究

袁文佳, 章岳光, 沈伟东, 马群, 刘旭

Characteristics of Nb2O5 thin films deposited by ion beam sputtering

Yuan Wen-Jia, Zhang Yue-Guang, Shen Wei-Dong, Ma Qun, Liu Xu
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  • 研究了离子束溅射(IBS)制备的Nb2O5薄膜的光学特性、应力、薄膜微结构等特性,系统地分析了辅助离子源的离子束能量和离子束流对薄膜特性的影响.结果显示,在辅助离子源不同参数情况下,折射率在波长550 nm处为2.310—2.276,应力值为-281—-152 MPa.在合适的工艺参数下,消光系数可小于10-4,薄膜具有很好的表面平整度.与用离子辅助沉积(IAD)制备的薄膜相比,IBS制备的薄膜具有更好的光学特性和薄膜微结构.
    Optical properties, stress and microstructure of Nb2O5 thin films prepared by ion beam sputtering (IBS) are investigated, and the effects of assist ion beam energy and ion current on characteristics of Nb2O5 thin films are systematically discussed. The results show that with different parameters of assisted ion source, the refractive index changes from 2.310 to 2.276 and residual stress varies from -281MPa to -152 MPa. The extinction coefficient of Nb2O5 can be under 10-4, and the surface is very smooth in an optimum deposition condition. Thin films deposited by IBS exhibit better optical properties and microstructures than those deposited by ion assisted deposition (IAD).
    • 基金项目: 国家自然科学基金(批准号:60708013,60608014)和浙江省自然科学基金(批准号:Y1090504) 资助的课题.
    [1]

    Wei D T 1989 Appl. Opt. 28 2813

    [2]

    Becker J, Scheuer V 1990 Appl. Opt. 29 4303

    [3]

    Ristau D 2005 Proc. of SPIE 5963 596313

    [4]

    Zhang D J, Li M Y, Gu P F 2004 Journal of Zhejiang University (Engineering Science) 38 1387 (in Chinese) [张德景、李明宇、顾培夫 2004 浙江大学学报 (工学版) 38 1387]

    [5]

    Lee C C, Hsu J C, WONG D H 2000 Optical and Quantum Electronics 32 327

    [6]

    Lee C C, Tien C L, Hsu J C 2002 Appl. Opt. 41 2043

    [7]

    Cetinörgü E, Baloukas B, Zabeida O, Klemberg-Sapieha J, Martinu L 2009 Appl. Opt. 48 4536

    [8]

    Liu J S 2003 Ion Beam Deposition Film Technology and Application (Beijing: National Defense Industry Press) p61—69 (in Chinese) [刘金声 2003 离子束沉积薄膜技术及其应用 (北京:国防工业出版社) 第61—69页]

    [9]

    Cen W, Zhang Y G, Chen W L, Gu P F 2009 Acta Phys. Sin. 58 7025 [岑 忞、章岳光、陈卫兰、顾培夫 2009 物理学报 58 7025]

    [10]

    Tang J F, Gu P F, Liu X, Li H F 2006 Modern Optical Thin Film Technology (Hangzhou: Zhejiang University Press) p403— 412 (in Chinese) [唐晋发、顾培夫、刘 旭、李海峰 2006 现代光学薄膜技术 (浙江:浙江大学出版社) 第403—412 页]

    [11]

    Mohan S, Krishna M 1995 Vacuum 46 645

    [12]

    Kaiser N, Pulker H K (Translated by Liu X, Wang Z S, Yi K) 2008 Optical Interference Coatings (Hangzhou: Zhejiang University Press) p145—158 (in Chinese) [凯泽 N, 普克 H K著 刘旭,王占山,易葵译 2008 光学干涉薄膜 (杭州:浙江大学出版社),第145—158页]

    [13]

    Chen W L, Gu P F, Wang Y, Zhang Y G, Liu X 2009 Acta Phys. Sin. 58 4316 (in Chinese) [陈为兰、顾培夫、王 颖、章岳光、刘 旭 2009 物理学报 57 4316]

    [14]

    Gu P F, Zheng Z R, Zhao Y J, Liu X 2006 Acta Phys.Sin. 55 6459 (in Chinese) [顾培夫、郑臻荣、赵永江、刘 旭 2006 物理学报 55 6459]

    [15]

    Di Y X, Ji X H, Hu M, Qin Y W, Chen J L 2006 Acta Phys. Sin. 55 5451 (in Chinese) [邸玉贤、计欣华、胡 明、秦玉文、陈金龙 2006 物理学报 55 5451]

    [16]

    Chen T C, Chu C J, Ho C H, Wu C C, Lee C C 2007 J. Appl. Phys. 101 043513

    [17]

    Davis C A 1993 Thin Solid Films 226 30

  • [1]

    Wei D T 1989 Appl. Opt. 28 2813

    [2]

    Becker J, Scheuer V 1990 Appl. Opt. 29 4303

    [3]

    Ristau D 2005 Proc. of SPIE 5963 596313

    [4]

    Zhang D J, Li M Y, Gu P F 2004 Journal of Zhejiang University (Engineering Science) 38 1387 (in Chinese) [张德景、李明宇、顾培夫 2004 浙江大学学报 (工学版) 38 1387]

    [5]

    Lee C C, Hsu J C, WONG D H 2000 Optical and Quantum Electronics 32 327

    [6]

    Lee C C, Tien C L, Hsu J C 2002 Appl. Opt. 41 2043

    [7]

    Cetinörgü E, Baloukas B, Zabeida O, Klemberg-Sapieha J, Martinu L 2009 Appl. Opt. 48 4536

    [8]

    Liu J S 2003 Ion Beam Deposition Film Technology and Application (Beijing: National Defense Industry Press) p61—69 (in Chinese) [刘金声 2003 离子束沉积薄膜技术及其应用 (北京:国防工业出版社) 第61—69页]

    [9]

    Cen W, Zhang Y G, Chen W L, Gu P F 2009 Acta Phys. Sin. 58 7025 [岑 忞、章岳光、陈卫兰、顾培夫 2009 物理学报 58 7025]

    [10]

    Tang J F, Gu P F, Liu X, Li H F 2006 Modern Optical Thin Film Technology (Hangzhou: Zhejiang University Press) p403— 412 (in Chinese) [唐晋发、顾培夫、刘 旭、李海峰 2006 现代光学薄膜技术 (浙江:浙江大学出版社) 第403—412 页]

    [11]

    Mohan S, Krishna M 1995 Vacuum 46 645

    [12]

    Kaiser N, Pulker H K (Translated by Liu X, Wang Z S, Yi K) 2008 Optical Interference Coatings (Hangzhou: Zhejiang University Press) p145—158 (in Chinese) [凯泽 N, 普克 H K著 刘旭,王占山,易葵译 2008 光学干涉薄膜 (杭州:浙江大学出版社),第145—158页]

    [13]

    Chen W L, Gu P F, Wang Y, Zhang Y G, Liu X 2009 Acta Phys. Sin. 58 4316 (in Chinese) [陈为兰、顾培夫、王 颖、章岳光、刘 旭 2009 物理学报 57 4316]

    [14]

    Gu P F, Zheng Z R, Zhao Y J, Liu X 2006 Acta Phys.Sin. 55 6459 (in Chinese) [顾培夫、郑臻荣、赵永江、刘 旭 2006 物理学报 55 6459]

    [15]

    Di Y X, Ji X H, Hu M, Qin Y W, Chen J L 2006 Acta Phys. Sin. 55 5451 (in Chinese) [邸玉贤、计欣华、胡 明、秦玉文、陈金龙 2006 物理学报 55 5451]

    [16]

    Chen T C, Chu C J, Ho C H, Wu C C, Lee C C 2007 J. Appl. Phys. 101 043513

    [17]

    Davis C A 1993 Thin Solid Films 226 30

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出版历程
  • 收稿日期:  2010-06-25
  • 修回日期:  2010-07-24
  • 刊出日期:  2011-02-05

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