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建立了坑点型划痕的旋转抛物面模型, 用三维时域有限差分方法研究了熔石英后表面坑点型划痕随深度、宽度、间距以及酸蚀量变化对波长 =355 nm入射激光的调制.研究表明, 这类划痕调制最强区位于相邻两坑点的连接区, 且越靠近表面调制越强.当其宽深比为2.03.5、坑点间距约为坑点宽度的1/2时, 可获得最大光场调制, 最大光强增强因子(LIEF)为11.53; 当坑点间距大于坑点宽度时, 其调制大为减弱, 相当于单坑的场调制.对宽为60 ( =/12), 深和间距均为30的坑点型划痕进行刻蚀模拟, 刻蚀过程中最大LIEF为11.0, 当间距小于300 nm时, 相邻坑点由于衍射形成场贯通.Rotating paraboloid model is establishd, and three-dimensional finite-difference time-domain method is used to simulate pit-shaped cracks on fused silica rear-surface. The light intensification with its depth, width, gap distance and etch value are investigated under 355 nm laser incident. Results show that the strongest modulation is located at the connection area between pit and pit, and the modulation become strong with approaching to the surface. The maximum light intensity enhancement factor (LIEF) is 11.53 when the breadth depth ratio ranges from 2.0 to 3.5 and gap distance close to 1/2 width. As gap distance greater than the width, the modulation reduces greatly, which is equal to a single pit. For 60-width, 30-depth and 30-gap distance cracks, the maximum LIEF is 11.0 during the acid etching. As the gap distance is less than 300 nm, the diffraction of the light field makes the neighbor pits connective.
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Keywords:
- fused silica /
- pit-shaped crack /
- laser irradiation /
- finite-difference time-domain
[1] Campbell J H, Hawley-Fedder R A, Stolz C J, Menapace J A, Borden M R, Whitman P K, Yu J, Runkel M J, Riley M O, Feit M D, Hackel R P 2004 Proc. SPIE 5341 84
[2] Huang W Q 2009 MS Thesis (Mianyang: China Academy of Engineering Physics) (in Chinese) [黄晚晴 2009 硕士学位论文 (绵阳: 中国工程物理研究院)]
[3] Belleville P, Prenè P, Bonnin C, Beaurain L, Montouillout Y, Lavastre É 2004 Proc. SPIE 5250 196
[4] Pègon P M, Germain C V, Rorato Y R, Belleville P F, Lavastre E 2004 Proc. SPIE 5250 170
[5] Bercegol H, Bouchut P R, Lamaignere L, Le Garrec B, Raze G 2004 Proc. SPIE 5273 312
[6] Papernov S, Schmid A W 2008 Proc. SPIE 7132 71321J-1
[7] Liu F M, Zhang L D, Li G H 2005 Chin. Phys. 14 2145
[8] Bloembergen N 1973 Appl. Opt. 12 661
[9] Hua J R, Zu X T, Li L, Xiang X, Chen M, Jiang X D, Yuan X D, Zheng W G 2010 Acta Phys. Sin. 59 2519 (in Chinese) [花金荣, 祖小涛, 李莉, 向霞, 陈猛, 蒋晓东, 袁晓东, 郑万国 2010 物理学报 59 2519]
[10] Hua J R, Li L, Xiang X, Zu X T 2011 Acta Phys. Sin. 60 044206 (in Chinese) [花金荣, 李莉, 向霞, 祖小涛 2011 物理学报 60 044206]
[11] Ge D B, Yan Y B 2005 FDTD Method for Electromagnetic Waves (Xi'an: Xidian University Press) (in Chinese) [葛德彪, 闫玉波 2005 电磁波时域有限差分方法 (西安: 西安电子科技大学出版社)]
[12] Wang F R, Huang J, Liu H J, Zhou X D, Jiang X D, Wu W D, Zheng W G 2010 Acta Phys. Sin. 59 5122 (in Chinese) [王凤蕊, 黄进, 刘红婕, 周信达, 蒋晓东, 吴卫东, 郑万国 2010 物理学报 59 5122]
[13] Miller G H, Moses E I, Wuest C R 2004 Opt. Eng. 43 2841
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[1] Campbell J H, Hawley-Fedder R A, Stolz C J, Menapace J A, Borden M R, Whitman P K, Yu J, Runkel M J, Riley M O, Feit M D, Hackel R P 2004 Proc. SPIE 5341 84
[2] Huang W Q 2009 MS Thesis (Mianyang: China Academy of Engineering Physics) (in Chinese) [黄晚晴 2009 硕士学位论文 (绵阳: 中国工程物理研究院)]
[3] Belleville P, Prenè P, Bonnin C, Beaurain L, Montouillout Y, Lavastre É 2004 Proc. SPIE 5250 196
[4] Pègon P M, Germain C V, Rorato Y R, Belleville P F, Lavastre E 2004 Proc. SPIE 5250 170
[5] Bercegol H, Bouchut P R, Lamaignere L, Le Garrec B, Raze G 2004 Proc. SPIE 5273 312
[6] Papernov S, Schmid A W 2008 Proc. SPIE 7132 71321J-1
[7] Liu F M, Zhang L D, Li G H 2005 Chin. Phys. 14 2145
[8] Bloembergen N 1973 Appl. Opt. 12 661
[9] Hua J R, Zu X T, Li L, Xiang X, Chen M, Jiang X D, Yuan X D, Zheng W G 2010 Acta Phys. Sin. 59 2519 (in Chinese) [花金荣, 祖小涛, 李莉, 向霞, 陈猛, 蒋晓东, 袁晓东, 郑万国 2010 物理学报 59 2519]
[10] Hua J R, Li L, Xiang X, Zu X T 2011 Acta Phys. Sin. 60 044206 (in Chinese) [花金荣, 李莉, 向霞, 祖小涛 2011 物理学报 60 044206]
[11] Ge D B, Yan Y B 2005 FDTD Method for Electromagnetic Waves (Xi'an: Xidian University Press) (in Chinese) [葛德彪, 闫玉波 2005 电磁波时域有限差分方法 (西安: 西安电子科技大学出版社)]
[12] Wang F R, Huang J, Liu H J, Zhou X D, Jiang X D, Wu W D, Zheng W G 2010 Acta Phys. Sin. 59 5122 (in Chinese) [王凤蕊, 黄进, 刘红婕, 周信达, 蒋晓东, 吴卫东, 郑万国 2010 物理学报 59 5122]
[13] Miller G H, Moses E I, Wuest C R 2004 Opt. Eng. 43 2841
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