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The principle of measuring electron emission threshold of surface area metal electrode is presented. The measurement system of electron emission thresholds of two electrodes is developed. The electron emission characteristics of materials with different roughness degrees or Cr2O3 coating-deposit 40 um are measured in “Chenguang” accelerator. The results show that polishing can suppress electron emission. The higher the roughness degree of material, the lower the electron emission threshold is. Material coated with Cr2O3 has higher electron emission threshold than polished material.
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Keywords:
- field emission /
- threshold /
- Faraday cup /
- “Chenguang” accelerator
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[2] Zhou J, Zhang P F, Yang H L, Sun J, Sun J F, Su Z F, Liu W D 2012 Acta Phys. Sin. 61 245203 (in Chinese)[周军, 张鹏飞, 杨海亮, 孙江, 孙剑锋, 苏兆锋, 刘万东 2012 物理学报 61 245203]
[3] Li L Q, Meng L, Deng J J, Song S Y, Zou W K, Liu D G, Liu S G 2010 Acta Phys. Sin. 59 1643 (in Chinese)[刘腊群, 蒙林, 邓建军, 宋盛义, 邹文康, 刘大刚, 刘盛纲 2010 物理学报 59 1643]
[4] David J J, Harry C I, Mark E S, William A S 2003 14th IEEE International Pulsed Power Conference Dallas, Texas, June 15-18, 2003 p1021
[5] David J J, William E F, Mark E S, William A S 2002 International Symposium on Discharges and Electrical Insulation in Vacuum Tours, France, 2002 p131
[6] He X P, Shi L, Zhang J S, Qiu A C 2000 High Power Laser and Particle Beams 12 753 (in Chinese) [何小平, 石磊, 张嘉生, 邱爱慈 2000 强激光与粒子束 12 753]
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[11] Zuo Y H, Wang J G, Fan R Y 2012 Acta Phys. Sin. 61 215202 (in Chinese)[左应红, 王建国, 范如玉 2012 物理学报 61 215202]
[12] Bai X, Zhang G M, Wang M S, Zhang Z X, Yu J, Zhao X Y, Guo D Z, Xue Z Q 2009 Chin. Phys. B 18 3517
[13] Wang Y Y, Li Y A, Xu J S, Gu G R 2012 Chin. Phys. B 21 087902
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[15] Wang X P, Wang L J, Duan X C, Wang L Y, Zhang L, L C R, Lei T 2009 Chin. Phys. B 18 2078
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[1] Guo F, Li Y D, Wang H G, Liu C L, Hu Y X, Zhang P F, Ma M 2011 Acta Phys. Sin. 60 102901 (in Chinese)[郭帆, 李永东, 王洪广, 刘纯亮, 呼义翔, 张鹏飞, 马萌 2011 物理学报 60 102901]
[2] Zhou J, Zhang P F, Yang H L, Sun J, Sun J F, Su Z F, Liu W D 2012 Acta Phys. Sin. 61 245203 (in Chinese)[周军, 张鹏飞, 杨海亮, 孙江, 孙剑锋, 苏兆锋, 刘万东 2012 物理学报 61 245203]
[3] Li L Q, Meng L, Deng J J, Song S Y, Zou W K, Liu D G, Liu S G 2010 Acta Phys. Sin. 59 1643 (in Chinese)[刘腊群, 蒙林, 邓建军, 宋盛义, 邹文康, 刘大刚, 刘盛纲 2010 物理学报 59 1643]
[4] David J J, Harry C I, Mark E S, William A S 2003 14th IEEE International Pulsed Power Conference Dallas, Texas, June 15-18, 2003 p1021
[5] David J J, William E F, Mark E S, William A S 2002 International Symposium on Discharges and Electrical Insulation in Vacuum Tours, France, 2002 p131
[6] He X P, Shi L, Zhang J S, Qiu A C 2000 High Power Laser and Particle Beams 12 753 (in Chinese) [何小平, 石磊, 张嘉生, 邱爱慈 2000 强激光与粒子束 12 753]
[7] Song X P, Chen R, Bao C Y, Wang D W 2005 Acta Phys. Sin. 54 4198 (in Chinese)[宋晓鹏, 陈戎, 包成玉, 王德武 2005 物理学报 54 4198]
[8] Yang H L, Qiu A C, Li J Y, Sun J F, He X P, Tang J P, Wang H Y, Huang J J, Ren S Q, Zou L L, Yang L 2005 Acta Phys. Sin. 54 4072 (in Chinese)[杨海亮, 邱爱慈, 李静雅, 孙剑锋, 何小平, 汤俊萍, 王海洋, 黄建军, 任书庆, 邹丽丽, 杨莉 2005 物理学报 54 4072]
[9] Liu Y X 1995 Electronic Emission and Photocathode (Beijing: Beijing Institute of Technology Press) p109 (in Chinese) [刘元霞 1995 电子发射与光电阴极 (北京: 北京理工大学出版社) 第109页]
[10] Zhu C C, Huangpu L J, Huai Y J 2002 Acta Phys. Sin. 51 382 (in Chinese)[朱长纯, 皇甫鲁江, 淮永进 2002 物理学报 51 382]
[11] Zuo Y H, Wang J G, Fan R Y 2012 Acta Phys. Sin. 61 215202 (in Chinese)[左应红, 王建国, 范如玉 2012 物理学报 61 215202]
[12] Bai X, Zhang G M, Wang M S, Zhang Z X, Yu J, Zhao X Y, Guo D Z, Xue Z Q 2009 Chin. Phys. B 18 3517
[13] Wang Y Y, Li Y A, Xu J S, Gu G R 2012 Chin. Phys. B 21 087902
[14] Wang J S 2008 Electronic Emission Material (Beijing: Beijing University of Technology Press) p197 (in Chinese) [王金淑 2008 电子发射材料 (北京: 北京工业大学出版社) 第197页]
[15] Wang X P, Wang L J, Duan X C, Wang L Y, Zhang L, L C R, Lei T 2009 Chin. Phys. B 18 2078
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