短管螺旋波放电中等离子体参数测量和模式转化研究

赵高; 熊玉卿; 马超; 刘忠伟; 陈强

doi:10.7498/aps.63.235202

摘要

对长度为45 cm的短放电管螺旋波放电等离子体进行了Langmuir探针、原子发射光谱以及集成电荷耦合检测器(ICCD)检测诊断, 研究螺旋波等离子体的放电特性. Langmuir探针数据显示电子密度在射频功率增加过程中出现两次大幅增长, 由此确认了放电模式的转换及螺旋波放电模式的出现. 发射光谱测量结果与Langmuir探针测量的电子密度数据一致, 发现Ar原子和Ar离子的谱线强度与放电模式变化有着密切相关性. 而通过对不同放电模式的ICCD测量, 获得射频功率吸收因放电模式转变而变化的方式, 认为放电模式转换时电子行为和能量传递方式也发生着变化.

关键词:

Abstract

Characteristics of helicon plasma in a 45 cm long discharge tube were diagnosed by the Langmuir electrostatic probe, optical emission spectroscopy (OES), and integrated capacitively coupled detector (ICCD). The discharge in helical wave mode was confirmed by the sharply variation of electron density and electron temperature based on the Langmuir data. We have noticed that the variation of electron density measured by the Langmuir electrostatic-probe is consistent with the OES measurement. Intensities in the spectra of argon atoms and ions are strongly related to discharge modes. The photos taken by ICCD can distinguish the discharge modes in the radial region. Intensity changes in the radial region reflect the electron motivation and the energy transfer path in the helicon plasma.

Keywords:

helicon discharge /
optical emission spectroscopy /
integrated capacitively coupled detector /
changes in radial region

作者及机构信息

1.
北京印刷学院等离子体物理及材料研究室, 北京 102600;

2.
兰州物理研究所, 真空技术与物理重点实验室, 兰州 730000

基金项目: 国家自然科学基金(批准号:11175024,11375031)、科技部十二五科技支撑项目(批准号:2011BAD24B01)、国家科技支撑计划(批准号:E-b-2012-40)、北京印刷学院重点项目(批准号:23190113051)、北京印刷学院科研基金和真空技术与物理重点实验室开放基金资助的课题.

Authors and contacts

1.
Laboratory of Plasma Physics and Materials, Beijing Institute of Graphic Communication, Beijing 102600, China;

2.
Science and Technology on Vacuum Technology and Physics Laboratory, Lanzhou Institute of Physics, Lanzhou 730000, China

Funds: Project supported by the National Natural Science Foundation of China (Grant Nos. 11175024, 11375031), the 12th Five-Year Science and Technology Support Project of the Ministry of Science and Technology of China (Grant No. 2011BAD24B01), the National Key Technology Research and Development Program of the Ministry of Science and Technology of China (Grant No. E-b-2012-40), the Key Project of Beijing Institute of Graphic Communication, China (Grant No. 23190113051), the Scientific Research Foundation of Beijing Institute of Graphic Communication, China, and the Open Fund of Science and Technology on Vacuum Technology and Physics Laboratory, China.

参考文献

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[12]	Chen F F, Torreblanca H 2007 Plasma Phys. Control Fusion 49 A81
[13]	Lafleur T, Charles C, Boswell R W 2011 J. Phys. D: Appl. Phys. 44 055202
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[16]	Xia G Q, Wang D X, Xue W H, Zhang J L 2011 J. Propuls. Technol. 32 857 (in Chinese) [夏广庆, 王冬雪, 薛伟华, 张家良2011推进技术 32 857]
[17]	Cheng Y G, Cheng M S, Wang M G, Li X K 2014 Acta Phys. Sin. 63 035203 (in Chinese) [成玉国, 程谋森, 王墨戈, 李小康 2014 物理学报 63 035203]
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施引文献

[1]	Aigrain P 1960 Proceeding of the International Conference Semiconductor Physics Prague, Czechoslovakia, 1960 p224
[2]	Boswell R W 1970 Phys. Lett. A 33 457
[3]	Fang T Z 1998 Physics 28 163 (in Chinese) [房同珍1998物理28 163]
[4]	Porte L, Yun S M, Arnush D, Chen F F 2003 Plasma Source Sci. Technol. 12 287
[5]	Chen F F 2003 Phys. Plasmas 10 2586
[6]	Sudit I D, Chen F F 1996 Plasma Source Sci. Technol. 5 43
[7]	Niemi K, Krämer M 2008 Phys. Plasmas 15 073503
[8]	Fang T Z, Wang L, Jiang D M, Zhang H X 2001 Chin. Phys. Lett. 18 1098
[9]	Fang T Z, Jiang N, Wang L 2005 Chin. Phys. 14 2256
[10]	Franck C M, Grulke O, Klinger T 2003 Phys. Plasmas 10 323
[11]	Boswell R W, Chen F F 1997 IEEE Trans. Plasma Sci. 25 1229
[12]	Chen F F, Torreblanca H 2007 Plasma Phys. Control Fusion 49 A81
[13]	Lafleur T, Charles C, Boswell R W 2011 J. Phys. D: Appl. Phys. 44 055202
[14]	Lafleur T, Charles C, Boswell R W 2011 J. Phys. D: Appl. Phys. 44 185204
[15]	Bo Y, Zhao Y, Jin C G, Yu T, Wu X M, Zhuge L J 2011 Micronano Electron. Technol. 48 739 (in Chinese) [柏洋, 赵岩, 金成刚, 余涛, 吴雪梅, 诸葛兰剑2011微纳电子技术 48 739]
[16]	Xia G Q, Wang D X, Xue W H, Zhang J L 2011 J. Propuls. Technol. 32 857 (in Chinese) [夏广庆, 王冬雪, 薛伟华, 张家良2011推进技术 32 857]
[17]	Cheng Y G, Cheng M S, Wang M G, Li X K 2014 Acta Phys. Sin. 63 035203 (in Chinese) [成玉国, 程谋森, 王墨戈, 李小康 2014 物理学报 63 035203]
[18]	Tysk S M, Denning C M, Scharer J E, White B O, Akhtar M K 2003 15th Topical Conference on RF Power Moran, USA, May 19-21, 2003 p427
[19]	Lieberman M A, Lichtenberg A J (translated by Pu Y K) 2007 Principles of Plasma Discharges and Materials Processing (Beijing: Science Press) p142 (in Chinese) [力伯曼M A, 里登伯格A J著(蒲以康译) 2007 等离子体放电物理与材料 (北京: 科学出版社) 第142页]
[20]	Loewenhardt P K, Blackwell B D, Boswell R W, Conway G D, Hamberger S M 1991 Phys. Rev. Lett. 67 2792
[21]	Ellingboe A R, Boswell R W 1995 Phys. Plasmas 2 1807
[22]	Chen F F, Boswell R W 1997 IEEE Trans. Plasma Sci. 25 1245
[23]	Ellingboe A R, Boswell R W 1996 Phys. Plasmas 3 2797

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