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脉冲偏压电弧离子镀Cr-O薄膜结构及光学性能研究

刘海永 张敏 林国强 韩克昌 张林

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脉冲偏压电弧离子镀Cr-O薄膜结构及光学性能研究

刘海永, 张敏, 林国强, 韩克昌, 张林

Structure and optical property of Cr-O films deposited by pulsed bias arc ion plating

Liu Hai-Yong, Zhang Min, Lin Guo-Qiang, Han Ke-Chang, Zhang Lin
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  • 采用脉冲偏压电弧离子镀技术在单晶硅基片及石英玻璃上制备了一系列均匀透明的Cr-O薄膜. 用场发射扫描电子显微镜、X射线衍射仪、X射线光电子谱、纳米压痕仪、紫外可见光分光光度计等方法对薄膜的表面形貌、膜厚、相结构、成分、元素的化学价态、硬度和光学性能等进行表征, 主要研究了偏压幅值对薄膜结构和性能的影响. 结果表明, 施加偏压可使薄膜的沉积质量明显提高, 其相结构由非晶态转变为晶体态, 并随着偏压幅值的增加, 由Cr2O3相向CrO相转变; 薄膜的硬度先增大后减小, 当偏压为-300 V时, 硬度达到最大值24.4 GPa; 薄膜具有良好的透光率, 最高可达72%; 当偏压为-200 V时, 薄膜的最大光学帯隙为1.88 eV.
    A series of uniform and transparent Cr-O films were synthesized on the silicon and quartz glass substrates at different bias voltages by pulsed bias arc ion plating. Effects of bias voltage on surface morphology, phase structure, composition, chemical valence states, hardness and optical property of the films were investigated by field emission scanning electron microscopy, grazing incident X-ray diffraction, X-ray photoelectron spectroscopy, nanoindentation and ultraviolet-visible spectrophotometer, respectively. Results indicate that the bias voltage can improve the quality of the films significantly and plays an important role in the film properties. Macroparticles and holes are observed on the surface of the films if without application of bias voltage, while the films prepared with bias voltage are uniform and smooth. The crystalline phase of the film is of amorphous structure if without bias voltage. While the bias voltage applies and increases from -100 V to -500 V, the Cr2O3 phase appears and changes into CrO phase. The crystal plane (104), (116) of the Cr2O3 phase and (200) of the Cr phase are observed in the film at the bias voltage of -100 V. When the bias voltage is above -200 V, the crystal planes (311) and (400) of the CrO phase can be observed. In order to further obtain the structure information, a detailed XPS study is performed. Chromium in the films shows different valence states, namely metallic Cr, Cr2+, Cr3+ and Cr6+. Thereby, the main components of the polycrystalline films are Cr2O3 and CrO phases, meanwhile, and the films also contain a small amount of CrO3 and metal Cr phases. The films under different bias voltage show good mechanical properties and the hardness of all the films is above 19 GPa. With the increase of bias voltage the hardness first increases and then decreases, reaching a maximum value of 24.4 GPa at the bias voltage of -300 V. The films show good optical transmittance and its highest value can be up to 72%. As the bias voltage rises, it is observed first the red shift and then blue shift of the absorption edge. And the optical band gap reaches the maximum value of 1.88 eV when the bias voltage is -200 V. Therefore, Cr-O functional films can be synthesized by pulsed bias arc ion plating and the phase structure and properties can be effectively adjusted.
    • 基金项目: 国家自然科学基金(批准号:51271047,51101080)资助的课题.
    • Funds: Project supported by the National Natural Science Foundation of China (Grant Nos. 51271047, 51101080).
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    Lin G Q, Zhao Y H, Guo H M, Wang D Z, Dong C 2004 J. Vac. Sci. Technol. A 22 1218

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    Wang T G, Jeong D, Kim S H, Wang Q, Shin D W, Melin S, Iyengar S, Kim K H 2012 Surf. Coat. Tech. 206 2629

    [10]

    Liu B, Nakatani H, Terano M 2002 J. Mol. Catal. A: Chem. 184 387

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    Maurice V, Cadot S, Marcus P 2000 Surf. Sci. 458 195

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    Benito N, Díaz D, Vergara L, Galindo R E, Sánchez O, Palacio C 2011 Surf. Coat. Tech. 206 1484

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  • [1]

    Khojier K, Savaloni H, Ashkabusi Z, Dehnavi NZ 2013 Appl. Surf. Sci. 284 489

    [2]

    Wang T G, Liu Y, Sina H, Shi C, Iyengar S, Melin S, Kim K H 2013 Surf. Coat. Tech. 228 140

    [3]

    Ji A L, Wang W, Song G H, Wang A Y, Sun C, Wen L S 2003 Acta Metall. Sin. 09 979 (in Chinese) [纪爱玲, 汪伟, 宋贵宏, 汪爱英, 孙超, 闻立时 2003 金属学报 09 979]

    [4]

    Wang B W, Shen H 2005 Acta Energi. Sin. 01 56 (in Chinese) [汪保卫, 沈辉 2005 太阳能学报 01 56]

    [5]

    Yang W, Chen K, Zheng S X, Guo S J 1999 Laser J. 06 14 (in Chinese) [羊旺, 陈凯, 郑顺镟, 郭斯淦 1999 激光杂志 06 14]

    [6]

    Zhang L, Ma G J, Lin G Q, Ma H, Han K C 2014 Chin. Phys. B 23 620

    [7]

    Zhang M, Lin G Q, Dong C, Wen L S 2007 Acta Phys. Sin. 56 7300 (in Chinese) [张敏, 林国强, 董闯, 闻立时 2007 物理学报 56 7300]

    [8]

    Lin G Q, Zhao Y H, Guo H M, Wang D Z, Dong C 2004 J. Vac. Sci. Technol. A 22 1218

    [9]

    Wang T G, Jeong D, Kim S H, Wang Q, Shin D W, Melin S, Iyengar S, Kim K H 2012 Surf. Coat. Tech. 206 2629

    [10]

    Liu B, Nakatani H, Terano M 2002 J. Mol. Catal. A: Chem. 184 387

    [11]

    Maurice V, Cadot S, Marcus P 2000 Surf. Sci. 458 195

    [12]

    Benito N, Díaz D, Vergara L, Galindo R E, Sánchez O, Palacio C 2011 Surf. Coat. Tech. 206 1484

    [13]

    Oliver W C, Pharr G M 1992 J. Mater. Res. 7 1564

    [14]

    Zeng L G, Liu F M, Zhong W W, Ding P, Cai L G, Zhou C C 2011 Acta Phys. Sin. 60 038203 (in Chinese) [曾乐贵, 刘发民, 钟文武, 丁芃, 蔡鲁刚, 周船仓 2011 物理学报 60 038203]

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出版历程
  • 收稿日期:  2014-10-14
  • 修回日期:  2015-02-10
  • 刊出日期:  2015-07-05

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