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激光尾场电子加速装置中, 为了获得可稳定重复产生的高质量单能尾场电子, 电子的可控注入是其中的关键. 基于自主设计的级联加速喷气靶, 研究离化注入、冲击波前沿注入等可控注入技术及其结合对尾场电子产生阈值、电子能谱及其稳定性的影响. 研究结果显示, 离化注入机制、冲击波前沿注入机制以及级联加速喷嘴的结合, 可以使尾场电子的注入阈值大幅度降低, 且电子的离化注入区域被限制于冲击波前沿处, 最终大幅度降低电子束的绝对能散、提高稳定性. 在最优化的条件下, 可以获得最小发散角为(3.6 × 3.8) mrad, 平均中心能量为(63.24 ± 6.12) MeV, 平均能散为(13.0 ± 3.9) MeV、平均电量为(5.99 ± 3.10) pC的重频单能尾场电子.Femtosecond electron bunches can be produced by laser plasma wakefield accelerators, with energy tunable from tens of MeV to a few GeV. In order to produce stable mono-energetic electron bunches, a critical issue is to control the injection of electron into the wakefield. The ionization injection is one of the most effective methods of controlling the injection, which is usually a continuous process. So, the electron bunches produced through ionization injection usually possess large energy spread. In order to optimize the ionization injection technique and produce stable monoenergetic wakefield electron beams, experimental studies are conducted on our 45 TW laser facility. In this work, a mixed injection mechanism assisted cascaded laser wakefield accelerator is presented. Based on a double-nozzle cascaded accelerator, the influences of ionization injection, shock wave front injection and their combination are experimentally studied. The results show that the lower threshold of the injection can be substantially reduced. The ionization injection is restricted within the shock wave front. As a result, mono-energetic electron bunches with reduced absolute energy spread can be stably produced. Under the most optimal conditions, the central energy and energy spread are (63.24 ± 6.12) MeV and (13.0 ± 3.9) MeV. The charge quantity of the electron bunches is (5.99 ± 3.10) pC. The minimum emitting anglular spread is (3.6 × 3.8) mrad.
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Keywords:
- wakefield acceleration /
- cascaded accelerator /
- shock wave front injection /
- ionization injection
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图 1 (a) 喷嘴设计及实验排布; (b) 气体密度分布侧视二维图; (c) 2 mm高处气体密度对应电子密度的一维分布
Fig. 1. (a) The gas jet designment and the experimental layout; (b) the side view of the gas density distribution; (c) the one dimensional electron density at a height of 2 mm from the gas jet.
图 2 电子束斑 (上)单喷嘴、纯He气结果; (下)双喷嘴无刀边、混合气结果
Fig. 2. Electron angular distribution for ((a)−(e)) single stage gas jet and ((f)−(j)) dual-stage gas jet.
图 3 电子束斑 (a)−(e) He气结果; (f)−(j) He气混入2.5% N2气结果
Fig. 3. The electron angular distribution for (a)−(e) pure He and (f)−(j) the mixed gas of He with 2.5% N2.
图 4 喷气气压650 kPa时发射角最小的电子束斑
Fig. 4. The spot size for shot 0562 when the jet pressure is 650 kPa.
图 5 喷气气压650 kPa时连续打靶5发, 磁谱仪测量到的电子能谱
Fig. 5. Electron energy spectra for continuous 5 shots under jet pressure of 650 kPa.
图 6 等离子体中电子在纵向相空间(x-γVx)的分布
Fig. 6. The Distribution of electrons in longitudinal phase space (x-γVx).
表 1 喷气气压650 kPa时连续打靶6发得到的电子束斑参数, θx,, θy为出射方向, σx, σy为角分布光斑的半高全宽直径
Table 1. The emitting direction θx, θy and the FWHM angular spread σx, σy of the electron angular distribution for continuous 6 shots under jet pressure of 650 kPa.
发次号 θx/mrad θy/mrad σx/mrad σy/mrad 558 –25.5 28.9 8.5 5.6 559 –22.1 27.3 5.0 5.6 560 –23.5 23.3 6.2 4.8 561 –19.0 23.3 6.5 5.1 562 –18.1 24.2 3.8 3.6 563 –19.7 19.4 6.4 4.4 
下载: 导出CSV
表 2 喷气气压650 kPa时连续打靶5发得到的电子能谱参数
Table 2. The central energy, charge and energy spread of the electrons for continuous 5 shots when the jet pressure is 650 kPa.
发次号 中心能量/MeV 电量/pC 能散FWHM/MeV 570 66.7 6.5 10 571 66.1 9.4 17 572 58.2 2.0 6.9 573 54.2 9.2 14.3 574 71 2.86 16.6
下载: 导出CSV
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[1] Tajima T, Dawson J M 1979 Phys. Rev. Lett. 43 267
Google Scholar
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Google Scholar
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Google Scholar
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