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中国物理学会期刊

大气压电晕等离子体射流制备氧化钛薄膜

CSTR: 32037.14.aps.70.20202181

Deposition of titanium oxide films by atmospheric pressure corona discharge plasma jet

CSTR: 32037.14.aps.70.20202181
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  • 大气压等离子体因具有很多独特优势从而在材料制备和表面工艺领域备受关注. 本文利用大气压针-板电晕放电等离子体射流制备氧化钛(TiO2)薄膜, 研究了电晕极性和放电参数对薄膜特性的影响. 实验测试了正负电晕等离子体射流的电学性能、发展过程和发射光谱, 并对不同条件下制备的TiO2薄膜进行了表征和分析. 结果表明: 负电晕等离子体射流制备的TiO2薄膜表面更均匀而且薄膜中钛(Ti)含量更高. 正负电晕等离子体射流制备的薄膜的结合力均优于4.7 N/cm, 表面电阻低于1010 Ω. 此外, 发现TiO2薄膜在基底表面沉积和在气相中成核存在竞争机制, 并进一步阐述了电晕放电等离子体制备薄膜的成膜机理和不同极性放电的差异. 本文结果将为大气压等离子体制备均匀、致密的功能氧化物薄膜材料提供有益参考.

     

    Atmospheric pressure plasma jet has received increasing attention due to its wide potential applications such as in material processing and surface modification. This paper presents the characteristics of titanium oxide (TiO2) thin films deposited by using atmospheric pressure corona plasma jet based on a needle-plate configuration. The influences of corona polarity and operating parameters on the properties of TiO2 films are investigated. The characteristics of positive and negative corona discharge, the developing process and the emission spectrum of the plasma jet are tested, and the TiO2 films prepared under different conditions are measured and analyzed. The results show that the TiO2 film prepared by negative corona plasma has a more uniform surface, and the Ti content in TiO2 film is higher than that by the positive corona plasma. The adhesion force is higher than 4.7 N/cm and the surface resistance of the film is less than 1010 Ω. The deposition of the TiO2 film is closely related to the nucleation mechanism of the precursor in the plasma jet and/or the interface between jet and substrate. These results will provide useful reference for preparing uniform and functional oxide film materials by atmospheric pressure plasma jet.

     

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