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中国物理学会期刊

ZrCuSiAs型锰基化合物ThMnSbN中的化学压力效应

CSTR: 32037.14.aps.71.20211706

Chemical pressure effects in ZrCuSiAs-type manganese-based compound ThMnSbN

CSTR: 32037.14.aps.71.20211706
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  • 采用固相反应法合成了一种ZrCuSiAs型准二维层状锰基化合物ThMnSbN. 基于X射线粉末衍射的结构精修显示, 该化合物属于P4/nmm空间群. 其晶胞参数为a = 4.1731 Å, c = 9.5160 Å. 电输运测量显示, 该化合物电阻率随温度下降缓慢上升, 且在16 K附近出现电阻率异常. 与此同时, 该材料的磁化率在同一温度附近出现异常, 显示出类似磁性相变的行为. 进一步的比热测量中没有观察到磁相变导致的比热异常. 另外, 低温下的比热分析显示, 该材料的电子比热系数为γ = 19.7 mJ·mol–1·K–2, 远高于其他同类锰基化合物. 该结果与电输运测量中观察到的低电阻率行为相符, 暗示ThMnSbN中费米面附近存在可观的电子态密度. 基于对一系列ZrCuSiAs型化合物晶体结构细节的比较, 分析了含有萤石型Th2N2层的系列化合物中导电层所受化学压力的不同作用形式.

     

    A quasi-two-dimensional manganese-based compound ThMnSbN is synthesized by the solid-state reaction method. Structural refinement based on X-ray powder diffraction shows that the compound structure belongs to the P4/nmm space group. The lattice parameters are a = 4.1731 Å and c = 9.5160 Å. Electrical transport measurements show that the resistivity of the compound is the lowest in the Mn-based family. When cooling it, its resistivity rises slowly and shows a shoulder-like anomaly at 16 K. Also, the magnetic susceptibility exhibits an anomaly at the very same temperature. Though the specific heat data indicate the inexistence of transition-induced anomaly, the electron specific heat coefficient of γ = 19.7 mJ·mol–1·K–2 is derived by fitting the low-temperature C-T curve. This γ value is much higher than those of the isostructural manganese-based compounds. Thus, the specific heat is consistent with the low resistivity, implying a considerable electronic density of states near the Fermi surface for ThMnSbN. By comparing the crystal structure for a group of ZrCuSiAs-type compounds, various chemical pressure effects of the fluorite-type Th2N2 layer on the conducting layer in different compounds are discussed.

     

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