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中国物理学会期刊

CuO/Al2O3/ZnO多层异质结的持续光电导增强及类神经突触特性研究

Sustained Photoconductivity Enhancement and Synapse-Like Properties of CuO/Al2O3/ZnO Multilayer Heterojunctions

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  • ZnO的持续光电导特性为实现ZnO基光电突触模拟器件提供了可能。本文采用磁控溅射在玻璃基底上设计制备了Cu/CuO/Al2O3/ZnO/ITO多层异质结器件,通过调节Al2O3间隔层溅射时间(0 min、1 min、3 min)并结合Ar氛围退火对器件性能进行改性研究。结果表明,Al2O3间隔层对器件暗电流特性有明显调控作用,退火后器件暗态输运整体更接近欧姆行为,且不同间隔层条件下仍保持可分辨的电学差异。在365 nm紫外激发下,器件均呈现典型持续光电导保持衰减特性,且电流幅度与保持性随功率密度增强而提高,其中3 min Al2O3器件表现出更强的残余电流保持。在脉冲光刺激下,三种器件均可实现兴奋性突触后电流可调、短期记忆向长期记忆转变、频率依赖可塑性以及配对脉冲促进等突触功能。最后结合双指数过程拟合显示秒级快速弛豫与103 s量级慢弛豫共同贡献,为ZnO基光电突触的界面结构设计与动力学调控提供了参考。

     

    The sustained photoconductivity of ZnO offers the potential for developing ZnO-based optoelectronic synaptic devices. However, the decay dynamics of sustained photoconductivity and the retention characteristics of the synaptic response are significantly influenced by interface recombination, defect state occupancy, and carrier transport at the heterojunction interfaces. Consequently, designing the interface structure is an effective strategy to regulate the optoelectronic synaptic performance of ZnO-based heterojunction devices. In this paper, Cu/CuO/Al2O3/ZnO/ITO multilayer heterojunction device is fabricated on glass substrates using magnetron sputtering. The device performance is modulated by varying the sputtering time of the Al2O3 interlayer (0 min, 1 min, and 3 min) and by introducing post-annealing treatment in an Ar atmosphere. The structure and electrical properties are characterized using SEM, EDS, XRD, absorption spectroscopy, current-voltage measurements, and time-dependent photoresponse. The results indicate that the device exhibits a distinct multilayer structure, and the Al2O3 interlayer produces pronounced modulation of the dark-current characteristics. After annealing, the dark-state transport behavior of the devices becomes more closely approximated by Ohmic conduction, while distinguishable electrical differences are retained among devices with different interlayer conditions. Under 365 nm ultraviolet light irradiation, all devices display typical persistent photoconductivity with a retention-and-decay response after the removal of UV excitation. Both the photocurrent amplitude and residual-current retention increase with increasing light power density. Compared to the device without an Al2O3 interlayer, the device with a 3 minute Al2O3 interlayer sputtering time demonstrates stronger residual-current retention and slower photocurrent decay.
    Under pulsed light stimulation, all three devices can achieve adjustable excitatory postsynaptic currents, transition from short-term memory to long-term memory, frequency-dependent plasticity, and paired-pulse facilitation. Double-exponential process fitting reveals that a rapid relaxation process on the second scale and a slow relaxation process on the order of 103 s jointly contribute to the photoresponse decay. These results suggest that the Al2O3 interlayer plays an important role in coordinating interfacial carrier transport, persistent-photoconductivity retention, and synaptic relaxation dynamics. This work provides useful guidance for the interface-structure design and dynamic regulation of ZnO-based optoelectronic synaptic devices.

     

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