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中国物理学会期刊

微纳晶粒金刚石薄膜的太赫兹光电特性研究

Study on Terahertz Optoelectronic Properties of Micro- and Nano- Grain Diamond Films

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  • 本文采用热丝化学气相沉积工艺,通过调控气相甲烷体积分数(1%-5%),在硅衬底上制备出高质量纳米(NCD)和微米晶粒(MCD)金刚石薄膜,并利用太赫兹时域光谱(THz TDS)技术,在室温和0.2-1.2 THz频段对金刚石薄膜的光电特性进行了研究。通过THz-TDS垂直反射测量,获得样品复光电导率σ(ω)(ω为角频率)的实部和虚部,利用Drude-Lorentz光电导率公式进行拟合,获得了金刚石薄膜的主要电学参数,如载流子浓度与电子有效质量的比值、电子弛豫时间、Lorentz频率等。XRD、SEM、Raman等表征测量结果表明:随着样品生长甲烷浓度的升高,金刚石晶粒尺寸由~2.1 μm细化至~83.9 nm,薄膜晶界密度增大,晶界处富集sp2石墨相,且sp2/sp3积分面积比值由0.32提高到8.31。THz-TDS测量结果显示:由于相对较大的晶粒且晶界处较少的石墨相碳、较弱的晶界电子散射,MCD薄膜的电学性能优于NCD薄膜;NCD薄膜中较强的石墨相晶界散射可导致样品具较小的THz光电导率,比MCD薄膜具较弱的THz光吸收。这些研究结果可为微纳晶粒金刚石薄膜在电子和光电子器件的应用提供科学研究参考。

     

    In this work, hot-filament chemical vapor deposition (HFCVD) was employed to fabricate four groups of microcrystalline diamond (MCD) and nanocrystalline diamond (NCD) films with continuously tunable grain sizes on silicon substrates by adjusting the volume fraction of methane (CH4) in the gas phase from 1% to 5%. Based on terahertz time-domain spectroscopy (THz-TDS), the terahertz optoelectronic properties of the two types of diamond films were systematically characterized at room temperature within the frequency range of 0.2-1.2 THz. A vertical reflection measurement configuration of THz-TDS was adopted for the experiments, and the test principle is displayed in Figure a. The variation laws of terahertz reflected electric field amplitude and phase angle of the two film samples with radiation frequency were obtained through experimental tests. Taking the MCD film sample as the typical research object, its frequency-domain response curves are shown in Figure b, and the inset of Figure b presents the corresponding terahertz time-domain spectrum of the sample. The complex photoconductivity σ(ω) of the films was further extracted from the vertical reflection time-domain spectral data. Data analysis indicates that the classic pure Drude model fails to effectively fit the measured photoconductivity spectra. In contrast, the Drude-Lorentz model, which incorporates the scattering effect of free carriers and the resonance effect of bound electrons, achieves a good fitting consistency with the experimental data (Figure c). Key electrical parameters, including the ratio of carrier density to effective carrier mass R=N/m*, the electronic relaxation time τ, and the Lorentz frequency ω0, were acquired based on the fitting results. Combined with the quantitative characterization results of X-ray diffraction (XRD), scanning electron microscopy (SEM), and Raman spectroscopy, the evolution laws of the microstructures and optoelectronic properties of the films were analyzed. With the gradual increase in CH4 concentration, the grain size of diamond decreases continuously from approximately 2.1 μm to 83.9 nm, accompanied by a continuous increase in the grain boundary density of the films. Meanwhile, sp2 graphitic carbon is gradually enriched at the grain boundaries, and the integral area ratio of sp2/sp3 phases increases monotonically from 0.32 to 8.31. The high-density graphitic carbon at grain boundaries acts as an intense carrier scattering center, which significantly reduces the carrier relaxation time and introduces localized bound electrons to induce terahertz resonance absorption. These effects ultimately lead to distinct differences in the optoelectronic properties between MCD and NCD films. Experimental tests and analytical results demonstrate that MCD films with large grain sizes possess lower grain boundary scattering loss and superior carrier transport performance, showing promising application prospects in diamond-based microelectronic devices. In comparison, NCD films exhibit weaker terahertz optical absorption intensity and have outstanding application potential as high-performance terahertz optical window materials. The research findings provide reliable theoretical and experimental support for the scientific research and industrial application of micro- and nano-crystalline diamond thin films in electronic and optoelectronic devices.

     

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