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中国物理学会期刊

基于离子注入技术的ZnMnO半导体材料的制备及光谱表征

CSTR: 32037.14.aps.55.2073

Preparation of ZnMnO by ion implantation and its spectral characterization

CSTR: 32037.14.aps.55.2073
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  • 通过离子注入技术制备了ZnMnO半导体材料,研究离子注入剂量与退火对材料光谱性质的影 响.Raman光谱研究发现,575cm-1处声子模展宽是由高剂量Mn注入引起的缺陷所 致,退火样品528cm-1振动模来自Mn相关的杂质振动.室温光致发光谱表明,退 火对高剂量注入样品的可见发光带有增强作用.

     

    This paper reports the fabrication of ZnMnO semiconductor by high-dose Mn impla ntion. We studied the influence of implantation dose and annealing on its optica l properties. The broad band at 575cm-1 in Raman spectrum is attribut ed to defects related to high-dose Mn implantion. The vibration modes at 528cm-1 are considered to be associated with Mn impurities. Room temperature photoluminescence spectra show that the high-dose Mn implantion can enhance the intensity in visible band.

     

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