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本文用角分辨光电子能谱(ARUPS)(He Ⅱ),低能电子衍射(LEED)和俄歇电子能谱AES等方法研究了NO在Cu(110)表面吸附的光电子能谱。测量结果表明:在150K左右,NO在Cu(11O)表面是一个比较复杂的分解吸附过程。随着暴露量的不同,在Cu(110)表面形成的分解吸附分子是不同的。在NO5L暴露量时,主要形成O原子和N2O分子吸附。吸附的LEED图形仍然是(1×1)。The investigation of ARUPS of nitric oxide adsorbed on Cu(110) is reported here. The results show that it is a complex dissociative process that occurs at 150 K. Varied with the exposure of NO, the different molecules which are dissociated from NO, are adsorbed on Cu (110). With 5L NO the dominant adsorbates are atomic oxygen and N2O molecules. The adsorption LEED pattern is still (1×1). The present problem has been studied by ARUPS, LEED and AES.
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